WO3 and WO3-x thin films prepared by DC hollow cathode discharge

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00555890" target="_blank" >RIV/68378271:_____/22:00555890 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/60461373:22310/22:43922672

Výsledek na webu

<a href="https://doi.org/10.1016/j.vacuum.2021.110679" target="_blank" >https://doi.org/10.1016/j.vacuum.2021.110679</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2021.110679" target="_blank" >10.1016/j.vacuum.2021.110679</a>

Jazyk výsledku

angličtina

Název v původním jazyce

WO3 and WO3-x thin films prepared by DC hollow cathode discharge

Popis výsledku v původním jazyce

Photoactive semiconducting crystalline films of non-stoichiometric tungsten oxides (WO3-x, 0 ≤ x ≤ 3) were deposited by DC hollow cathode discharge from a tungsten nozzle in a reactive Ar + O2 atmosphere. The ratio of tungsten to oxygen in the layer was driven by controlling the O2 flow. All layers were prepared on soda-lime glass substrate (SLG) and on glass substrates coated with an FTO thin film and after deposition were annealed in air or argon atmosphere. The properties of WO3-x layers were analyzed with respect to their potential applications. Surface morphology was analyzed by SEM, qualitative phase analysis by XRD and Raman spectroscopy, chemical composition by EDX and photoactivity of individual samples by linear voltammetry. The layers stoichiometrically closest to WO3 and annealed in an argon atmosphere showed the highest photoactivity response.

Název v anglickém jazyce

WO3 and WO3-x thin films prepared by DC hollow cathode discharge

Popis výsledku anglicky

Photoactive semiconducting crystalline films of non-stoichiometric tungsten oxides (WO3-x, 0 ≤ x ≤ 3) were deposited by DC hollow cathode discharge from a tungsten nozzle in a reactive Ar + O2 atmosphere. The ratio of tungsten to oxygen in the layer was driven by controlling the O2 flow. All layers were prepared on soda-lime glass substrate (SLG) and on glass substrates coated with an FTO thin film and after deposition were annealed in air or argon atmosphere. The properties of WO3-x layers were analyzed with respect to their potential applications. Surface morphology was analyzed by SEM, qualitative phase analysis by XRD and Raman spectroscopy, chemical composition by EDX and photoactivity of individual samples by linear voltammetry. The layers stoichiometrically closest to WO3 and annealed in an argon atmosphere showed the highest photoactivity response.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

1879-2715

Svazek periodika

195

Číslo periodika v rámci svazku

Jan

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

10

Strana od-do

110679

Kód UT WoS článku

000732993600005

EID výsledku v databázi Scopus

2-s2.0-85117190905