Optical emission spectroscopy analysis of microwave plasma-enhanced chemical vapor deposition systems dynamic gas response

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00570231" target="_blank" >RIV/68378271:_____/23:00570231 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21230/23:00359304 RIV/68407700:21460/23:00359304

Výsledek na webu

<a href="https://doi.org/10.1002/pssa.202200322" target="_blank" >https://doi.org/10.1002/pssa.202200322</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/pssa.202200322" target="_blank" >10.1002/pssa.202200322</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Optical emission spectroscopy analysis of microwave plasma-enhanced chemical vapor deposition systems dynamic gas response

Popis výsledku v původním jazyce

Microwave plasma-enhanced chemical vapor deposition (MWPECVD) is widely used for the growth of synthetic doped diamond for electronic and electrochemical applications. Recent results have shown the possible enhancement of phosphorus incorporation using the pulsed gas injection growth method. It is therefore important to understand the dynamics of precursor gases to optimize the dopants incorporation in diamond. In this work, the dynamic response of different gases (N-2, CH4, and O-2) impulses in hydrogen plasma is studied in two different MWPECVD reactors: a lab made NIRIM type reactor, and a commercial reactor made by Seki Diamond Systems. These reactors of different volumes are operated at different pressure and total gas flow. The time responses to the precursor gas injection are recorded by optical emission spectroscopy. Experimental time responses are fitted using an impulse response equation.

Název v anglickém jazyce

Optical emission spectroscopy analysis of microwave plasma-enhanced chemical vapor deposition systems dynamic gas response

Popis výsledku anglicky

Microwave plasma-enhanced chemical vapor deposition (MWPECVD) is widely used for the growth of synthetic doped diamond for electronic and electrochemical applications. Recent results have shown the possible enhancement of phosphorus incorporation using the pulsed gas injection growth method. It is therefore important to understand the dynamics of precursor gases to optimize the dopants incorporation in diamond. In this work, the dynamic response of different gases (N-2, CH4, and O-2) impulses in hydrogen plasma is studied in two different MWPECVD reactors: a lab made NIRIM type reactor, and a commercial reactor made by Seki Diamond Systems. These reactors of different volumes are operated at different pressure and total gas flow. The time responses to the precursor gas injection are recorded by optical emission spectroscopy. Experimental time responses are fitted using an impulse response equation.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Physica Status Solidi A

ISSN

1862-6300

e-ISSN

1862-6319

Svazek periodika

220

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

5

Strana od-do

2200322

Kód UT WoS článku

000847920600001

EID výsledku v databázi Scopus

2-s2.0-85137227241