Study of Dynamic Gas Response of Microwave Plasma Enhanced Chemical Vapor Deposition Systems by Optical Emission Spectroscopy

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F21%3A00356602" target="_blank" >RIV/68407700:21230/21:00356602 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21460/21:00356602

Výsledek na webu

<a href="https://doi.org/10.37904/nanocon.2021.4379" target="_blank" >https://doi.org/10.37904/nanocon.2021.4379</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.37904/nanocon.2021.4379" target="_blank" >10.37904/nanocon.2021.4379</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Study of Dynamic Gas Response of Microwave Plasma Enhanced Chemical Vapor Deposition Systems by Optical Emission Spectroscopy

Popis výsledku v původním jazyce

Microwave Plasma Enhanced Chemical Vapor Deposition (MWPECVD) is widely used for the growth and the study of synthetic doped diamond and its electronic and electrochemical applications. Recent results show the possible enhancement of dopant incorporation in diamond using pulsed gas injection in the reactor. Therefore, understanding the gas dynamic of the MWPECVD reactors is crucial to the optimization of the gas flows and diamond doping. In this work, we present a method to determine the gas dynamic response of a MWPECVD reactor. We determined the dynamic response of injected gas in a NIRIM type and a linear antenna type MWPECVD reactor by recording light emission from a hydrogen plasma during the instantaneous injection of a small fraction of nitrogen using either Optical Emission Spectroscopy (OES) or the combination of a photodiode and an optical band filter. Using linear system theory, we developed a program to determine the dynamic response of the reactor to an arbitrary shaped gas flow input from its pulse response.

Název v anglickém jazyce

Study of Dynamic Gas Response of Microwave Plasma Enhanced Chemical Vapor Deposition Systems by Optical Emission Spectroscopy

Popis výsledku anglicky

Microwave Plasma Enhanced Chemical Vapor Deposition (MWPECVD) is widely used for the growth and the study of synthetic doped diamond and its electronic and electrochemical applications. Recent results show the possible enhancement of dopant incorporation in diamond using pulsed gas injection in the reactor. Therefore, understanding the gas dynamic of the MWPECVD reactors is crucial to the optimization of the gas flows and diamond doping. In this work, we present a method to determine the gas dynamic response of a MWPECVD reactor. We determined the dynamic response of injected gas in a NIRIM type and a linear antenna type MWPECVD reactor by recording light emission from a hydrogen plasma during the instantaneous injection of a small fraction of nitrogen using either Optical Emission Spectroscopy (OES) or the combination of a photodiode and an optical band filter. Using linear system theory, we developed a program to determine the dynamic response of the reactor to an arbitrary shaped gas flow input from its pulse response.

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

—

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Nanocon 2021 - ABSTRACTS

ISBN

978-80-88365-00-6

ISSN

—

e-ISSN

—

Počet stran výsledku

6

Strana od-do

411-416

Název nakladatele

TANGER

Místo vydání

Ostrava

Místo konání akce

Brno

Datum konání akce

20. 10. 2021

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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