CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00577303" target="_blank" >RIV/68378271:_____/23:00577303 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989592:15310/23:73621390

Výsledek na webu

<a href="https://hdl.handle.net/11104/0346510" target="_blank" >https://hdl.handle.net/11104/0346510</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/6.0002902" target="_blank" >10.1116/6.0002902</a>

Jazyk výsledku

angličtina

Název v původním jazyce

CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering

Popis výsledku v původním jazyce

In this study, thin films of CuFeO2 were prepared using radio frequency reactive sputtering (RF) and reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma (HiPIMS-ECWR). The plasma was characterized using an RF ion probe. Plasma density, tail electron energy, and electron temperature were extracted from the measured data. The films were deposited on fluorine-doped tin oxide-coated glass and quartz glass, with the substrates being heated during the deposition process. The final delafossite CuFeO2 structure was formed after annealing in an argon gas flow at 550–600 °C. The ideal deposition conditions were found to be with a stoichiometric ratio of Cu:Fe = 1:1, which was the optimal condition for creating the delafossite CuFeO2 structure. The measured optical bandgap of CuFeO2 was 1.4 eV.

Název v anglickém jazyce

CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering

Popis výsledku anglicky

In this study, thin films of CuFeO2 were prepared using radio frequency reactive sputtering (RF) and reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma (HiPIMS-ECWR). The plasma was characterized using an RF ion probe. Plasma density, tail electron energy, and electron temperature were extracted from the measured data. The films were deposited on fluorine-doped tin oxide-coated glass and quartz glass, with the substrates being heated during the deposition process. The final delafossite CuFeO2 structure was formed after annealing in an argon gas flow at 550–600 °C. The ideal deposition conditions were found to be with a stoichiometric ratio of Cu:Fe = 1:1, which was the optimal condition for creating the delafossite CuFeO2 structure. The measured optical bandgap of CuFeO2 was 1.4 eV.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films

ISSN

0734-2101

e-ISSN

1520-8559

Svazek periodika

41

Číslo periodika v rámci svazku

6

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

13

Strana od-do

063005

Kód UT WoS článku

001084484900003

EID výsledku v databázi Scopus

2-s2.0-85173238774