The study of gamma-radiation induced displacement damage in n+-in-p silicon diodes
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F24%3A00587854" target="_blank" >RIV/68378271:_____/24:00587854 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/61989592:15310/24:73627625
Výsledek na webu
<a href="https://doi.org/10.1016/j.nima.2024.169432" target="_blank" >https://doi.org/10.1016/j.nima.2024.169432</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.nima.2024.169432" target="_blank" >10.1016/j.nima.2024.169432</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
The study of gamma-radiation induced displacement damage in n+-in-p silicon diodes
Popis výsledku v původním jazyce
The bulk damage of p-type silicon sensors caused by gamma irradiation with high total ionizing doses has been investigated. The study was carried out on different types of n +-in- p silicon diodes with different oxygen concentrations and silicon bulk resistivities. The Secondary-Ion Mass Spectrometry technique was used to determine the relative concentration of oxygen in the individual samples. The measured diodes were irradiated by a 60 Co gamma source to total ionizing doses ranging from 0.50 up to 8.28 MGy, and annealed for 80 min at 60 degrees C. The main goal of the study was to characterize the gamma-radiation induced displacement damage by measuring I-V and C-V characteristics, and the evolution of the full depletion voltage with the total ionizing dose. The Transient Current Technique was used to verify the full depletion voltage and to extract the electric field distribution and the sign of the space charge in the silicon diodes irradiated to the lowest and the highest delivered total ionizing doses. The results show a linear increase of the bulk leakage current with the total ionizing dose, with the damage coefficient being dependent on initial resistivity and oxygen concentration of the silicon diode. The effective doping concentration and full depletion voltage decrease significantly with an increasing total ionizing dose, before starting to increase again at a specific dose. We assume that the initial decrease in the effective doping concentration is caused by the effect of acceptor removal. An additional notable finding of this study is that the bulk leakage current and C-V characteristics of the gamma-irradiated diodes do not show any evidence of an annealing effect.
Název v anglickém jazyce
The study of gamma-radiation induced displacement damage in n+-in-p silicon diodes
Popis výsledku anglicky
The bulk damage of p-type silicon sensors caused by gamma irradiation with high total ionizing doses has been investigated. The study was carried out on different types of n +-in- p silicon diodes with different oxygen concentrations and silicon bulk resistivities. The Secondary-Ion Mass Spectrometry technique was used to determine the relative concentration of oxygen in the individual samples. The measured diodes were irradiated by a 60 Co gamma source to total ionizing doses ranging from 0.50 up to 8.28 MGy, and annealed for 80 min at 60 degrees C. The main goal of the study was to characterize the gamma-radiation induced displacement damage by measuring I-V and C-V characteristics, and the evolution of the full depletion voltage with the total ionizing dose. The Transient Current Technique was used to verify the full depletion voltage and to extract the electric field distribution and the sign of the space charge in the silicon diodes irradiated to the lowest and the highest delivered total ionizing doses. The results show a linear increase of the bulk leakage current with the total ionizing dose, with the damage coefficient being dependent on initial resistivity and oxygen concentration of the silicon diode. The effective doping concentration and full depletion voltage decrease significantly with an increasing total ionizing dose, before starting to increase again at a specific dose. We assume that the initial decrease in the effective doping concentration is caused by the effect of acceptor removal. An additional notable finding of this study is that the bulk leakage current and C-V characteristics of the gamma-irradiated diodes do not show any evidence of an annealing effect.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
10303 - Particles and field physics
Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Ostatní
Rok uplatnění
2024
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Nuclear Instruments & Methods in Physics Research Section A
ISSN
0168-9002
e-ISSN
1872-9576
Svazek periodika
1064
Číslo periodika v rámci svazku
July
Stát vydavatele periodika
NL - Nizozemsko
Počet stran výsledku
7
Strana od-do
169432
Kód UT WoS článku
001264851600001
EID výsledku v databázi Scopus
2-s2.0-85193598762