Comparison of ultra-short pulses laser damage performance of UV AR coatings deposited by e-beam evaporation and magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F24%3A00605129" target="_blank" >RIV/68378271:_____/24:00605129 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1117/12.3033269" target="_blank" >http://dx.doi.org/10.1117/12.3033269</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1117/12.3033269" target="_blank" >10.1117/12.3033269</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Comparison of ultra-short pulses laser damage performance of UV AR coatings deposited by e-beam evaporation and magnetron sputtering

Popis výsledku v původním jazyce

Thin-film layer systems coated by various techniques on the optical component surface are the most common method to finishing laser optics. Anti-reflective thin-film coatings are essential in laser optics to limit unwanted retro-reflections and decrease the reflection-induced losses occurring on boundaries of optical materials and air. Several different technologies are available to prepare laser-quality coatings, when the most common are magnetron sputtering and electron-beam ion-assisted deposition. However, coating materials and deposition parameters may significantly affect both laser resistance and optical quality of the coatings, and the influence of mentioned factors is getting stronger with shorter wavelengths. In following will be disseminated laser damage threshold of anti-reflective coatings prepared by e-beam evaporation with ion assisted deposition and plasma activated reactive magnetron sputtering at wavelength 343 nm in ultra-short pulses regime.

Název v anglickém jazyce

Comparison of ultra-short pulses laser damage performance of UV AR coatings deposited by e-beam evaporation and magnetron sputtering

Popis výsledku anglicky

Thin-film layer systems coated by various techniques on the optical component surface are the most common method to finishing laser optics. Anti-reflective thin-film coatings are essential in laser optics to limit unwanted retro-reflections and decrease the reflection-induced losses occurring on boundaries of optical materials and air. Several different technologies are available to prepare laser-quality coatings, when the most common are magnetron sputtering and electron-beam ion-assisted deposition. However, coating materials and deposition parameters may significantly affect both laser resistance and optical quality of the coatings, and the influence of mentioned factors is getting stronger with shorter wavelengths. In following will be disseminated laser damage threshold of anti-reflective coatings prepared by e-beam evaporation with ion assisted deposition and plasma activated reactive magnetron sputtering at wavelength 343 nm in ultra-short pulses regime.

Druh

D - Stať ve sborníku

CEP obor

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OECD FORD obor

10306 - Optics (including laser optics and quantum optics)

Projekt

<a href="/cs/project/EI22_002%2F0000677" target="_blank" >EI22_002/0000677: Pokročilá optika pro aplikace ultrakrátkých laserových pulzů ve vlnové oblasti DUV, VIS a NIR</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Proceedings of SPIE

ISBN

978-151068088-3

ISSN

0277-786X

e-ISSN

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Počet stran výsledku

9

Strana od-do

1319004

Název nakladatele

SPIE

Místo vydání

Bellingham

Místo konání akce

San Ramon

Datum konání akce

7. 10. 2024

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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