Investigation of microstructure and oxidation properties of amorphous and nanocrystalline HfNbTaTiZr high-entropy alloy thin films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F25%3A00604229" target="_blank" >RIV/68378271:_____/25:00604229 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216208:11320/25:10507886

Výsledek na webu

<a href="https://doi.org/10.1016/j.surfcoat.2024.131642" target="_blank" >https://doi.org/10.1016/j.surfcoat.2024.131642</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2024.131642" target="_blank" >10.1016/j.surfcoat.2024.131642</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Investigation of microstructure and oxidation properties of amorphous and nanocrystalline HfNbTaTiZr high-entropy alloy thin films

Popis výsledku v původním jazyce

In this study, the deposition, annealing process, and oxidation properties of HfNbTaTiZr high-entropy alloy thin films were thoroughly investigated. The films, approximately 250 nm thick, were deposited on MgO substrates by DC magnetron sputtering using a single target. The preparation temperature was identified as a key factor influencing the resulting structure. Amorphous films formed at room temperature, whereas nanocrystalline films, characterized by multiple intermetallic phases, were obtained either by deposition at elevated temperatures (600 ◦C – 750 ◦C) or through in situ annealing of amorphous films (600 ◦C – 700 ◦C). Positron annihilation spectroscopy revealed that nanocrystalline films predominantly contain vacancy-like misfit defects, with concentration decreasing as the preparation temperature increases.

Název v anglickém jazyce

Investigation of microstructure and oxidation properties of amorphous and nanocrystalline HfNbTaTiZr high-entropy alloy thin films

Popis výsledku anglicky

In this study, the deposition, annealing process, and oxidation properties of HfNbTaTiZr high-entropy alloy thin films were thoroughly investigated. The films, approximately 250 nm thick, were deposited on MgO substrates by DC magnetron sputtering using a single target. The preparation temperature was identified as a key factor influencing the resulting structure. Amorphous films formed at room temperature, whereas nanocrystalline films, characterized by multiple intermetallic phases, were obtained either by deposition at elevated temperatures (600 ◦C – 750 ◦C) or through in situ annealing of amorphous films (600 ◦C – 700 ◦C). Positron annihilation spectroscopy revealed that nanocrystalline films predominantly contain vacancy-like misfit defects, with concentration decreasing as the preparation temperature increases.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

<a href="/cs/project/GA23-05002S" target="_blank" >GA23-05002S: Černé kovy povrchově dekorované MXeny jako citlivé vrstvy chemirezistorů</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

1879-3347

Svazek periodika

496

Číslo periodika v rámci svazku

Jan

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

12

Strana od-do

131642

Kód UT WoS článku

001388565600001

EID výsledku v databázi Scopus

2-s2.0-85211584073