Mechanical and optical properties of HfO2 thin films prepared by evaporation with ion-assisted deposition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F25%3A00642493" target="_blank" >RIV/68378271:_____/25:00642493 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989592:15310/25:73632761

Výsledek na webu

<a href="https://doi.org/10.1016/j.mtcomm.2025.114125" target="_blank" >https://doi.org/10.1016/j.mtcomm.2025.114125</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.mtcomm.2025.114125" target="_blank" >10.1016/j.mtcomm.2025.114125</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Mechanical and optical properties of HfO2 thin films prepared by evaporation with ion-assisted deposition

Popis výsledku v původním jazyce

Hafnium dioxide (HfO2) is a material characterised by a unique combination of mechanical, thermal, and chemical stability. It is used in a wide range technological applications in electronics and optics. This article investigates how different deposition methods and subsequent annealing processes affect the structural, mechanical, and optical properties of HfO2 thin films. The films were deposited by electron beam evaporation, with and without ion-assisted deposition (IAD), followed by annealing at various temperatures (300-600 degrees C) in either vacuum or air. Mechanical properties such as hardness and elastic modulus were determined using nanoindentation. Cohesive and adhesive properties of the films were examined using scratch tests. Surface morphology was determined using a confocal microscope and the structure was studied by X-ray diffraction (XRD). Optical properties such as refractive index and absorption coefficient were measured by means of spectroscopic ellipsometry. The effects of the deposition method and subsequent annealing on the film properties were clearly observed. In general, films produced with IAD exhibited better ability to crystallise, improved mechanical properties, significantly higher value of hardness (above 30 % higher for as-deposited films) and considerably better scratch resistance, and higher refractive index due to higher film density. Annealing proved to be an effective tool for inducing phase transformation from an amorphous to a crystalline structure. The structural changes due to annealing were accompanied by changes in mechanical properties such as sudden increase in hardness of 20 - 27 %. Air-annealed films were harder than vacuum-annealed ones. Films deposited without IAD had lower refractive index after air annealing than after vacuum annealing, while IAD films showed no significant change in refractive index upon annealing.

Název v anglickém jazyce

Mechanical and optical properties of HfO2 thin films prepared by evaporation with ion-assisted deposition

Popis výsledku anglicky

Hafnium dioxide (HfO2) is a material characterised by a unique combination of mechanical, thermal, and chemical stability. It is used in a wide range technological applications in electronics and optics. This article investigates how different deposition methods and subsequent annealing processes affect the structural, mechanical, and optical properties of HfO2 thin films. The films were deposited by electron beam evaporation, with and without ion-assisted deposition (IAD), followed by annealing at various temperatures (300-600 degrees C) in either vacuum or air. Mechanical properties such as hardness and elastic modulus were determined using nanoindentation. Cohesive and adhesive properties of the films were examined using scratch tests. Surface morphology was determined using a confocal microscope and the structure was studied by X-ray diffraction (XRD). Optical properties such as refractive index and absorption coefficient were measured by means of spectroscopic ellipsometry. The effects of the deposition method and subsequent annealing on the film properties were clearly observed. In general, films produced with IAD exhibited better ability to crystallise, improved mechanical properties, significantly higher value of hardness (above 30 % higher for as-deposited films) and considerably better scratch resistance, and higher refractive index due to higher film density. Annealing proved to be an effective tool for inducing phase transformation from an amorphous to a crystalline structure. The structural changes due to annealing were accompanied by changes in mechanical properties such as sudden increase in hardness of 20 - 27 %. Air-annealed films were harder than vacuum-annealed ones. Films deposited without IAD had lower refractive index after air annealing than after vacuum annealing, while IAD films showed no significant change in refractive index upon annealing.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

<a href="/cs/project/EF17_049%2F0008422" target="_blank" >EF17_049/0008422: Partnerská síť v oblasti výzkumu a vývoje zobrazovací a osvětlovací techniky a optoelektroniky pro optický a automobilový průmysl</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Materials Today Communications

ISSN

2352-4928

e-ISSN

2352-4928

Svazek periodika

49

Číslo periodika v rámci svazku

Dec

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

11

Strana od-do

114125

Kód UT WoS článku

001606038700002

EID výsledku v databázi Scopus

2-s2.0-105020861575