The critical influence of surface topography on nanoindentation measurements of a-SiC: H films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21220%2F15%3A00233625" target="_blank" >RIV/68407700:21220/15:00233625 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216305:26310/15:PU115699

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2014.11.049" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2014.11.049</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2014.11.049" target="_blank" >10.1016/j.surfcoat.2014.11.049</a>

Jazyk výsledku

angličtina

Název v původním jazyce

The critical influence of surface topography on nanoindentation measurements of a-SiC: H films

Popis výsledku v původním jazyce

Hydrogenated amorphous silicon-carbon films were prepared on polished silicon wafers from a tetravinylsilane precursor via plasma-enhanced chemical vapor deposition. The grain structure was developed at the film surface using high powers (50-70. W), as observed by atomic force microscopy (AFM). Conventional and cyclic nanoindentation measurements revealed different mechanical responses for indentation into and outside of the selected isolated grain with a spherical cap geometry with a radius greater than that of the indenter (50. nm). The finite element method was employed to simulate the behavior of the grain under deformation by an indenter to correctly interpret the nanoindentation data. Scanning probe measurements using modulus mapping (dynamic mechanical analysis) and atomic force acoustic microscopy confirmed that the surface topography had a critical influence on the determined mechanical properties, which were significantly underestimated. Our experimental and simulation study demonstrates that nanoindentation and scanning probe measurements must be performed on strictly flat surfaces. This conclusion applies to all AFM measurements performed in contact and semi-contact mode used to characterize mechanical properties based on the geometry of the contact.

Název v anglickém jazyce

The critical influence of surface topography on nanoindentation measurements of a-SiC: H films

Popis výsledku anglicky

Hydrogenated amorphous silicon-carbon films were prepared on polished silicon wafers from a tetravinylsilane precursor via plasma-enhanced chemical vapor deposition. The grain structure was developed at the film surface using high powers (50-70. W), as observed by atomic force microscopy (AFM). Conventional and cyclic nanoindentation measurements revealed different mechanical responses for indentation into and outside of the selected isolated grain with a spherical cap geometry with a radius greater than that of the indenter (50. nm). The finite element method was employed to simulate the behavior of the grain under deformation by an indenter to correctly interpret the nanoindentation data. Scanning probe measurements using modulus mapping (dynamic mechanical analysis) and atomic force acoustic microscopy confirmed that the surface topography had a critical influence on the determined mechanical properties, which were significantly underestimated. Our experimental and simulation study demonstrates that nanoindentation and scanning probe measurements must be performed on strictly flat surfaces. This conclusion applies to all AFM measurements performed in contact and semi-contact mode used to characterize mechanical properties based on the geometry of the contact.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

CF - Fyzikální chemie a teoretická chemie

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface & Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

261

Číslo periodika v rámci svazku

leden

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

114-121

Kód UT WoS článku

000348255500015

EID výsledku v databázi Scopus

2-s2.0-84920733588