Structural and morphological nature of Ti-Si layers
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21220%2F25%3A00387568" target="_blank" >RIV/68407700:21220/25:00387568 - isvavai.cz</a>
Výsledek na webu
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DOI - Digital Object Identifier
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Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Structural and morphological nature of Ti-Si layers
Popis výsledku v původním jazyce
The structure and morphology of binary Ti-Si thin films were studied. Ti-Si surface alloys were deposited by electron beam. The Si content was controlled by the evaporation rate of Ti and Si targets. The structure was investigated by X-ray diffraction (XRD) and the morphology and surface roughness were measured by atomic force microscopy (AFM). The results show that the morphology and surface roughness reflect the structural evolution. The crystalline nature of Ti-Si thin films tends to nanocrystalline form. Higher amounts of Si resulted in an amorphous structure with a smoothed surface morphology and the lowest roughness.
Název v anglickém jazyce
Structural and morphological nature of Ti-Si layers
Popis výsledku anglicky
The structure and morphology of binary Ti-Si thin films were studied. Ti-Si surface alloys were deposited by electron beam. The Si content was controlled by the evaporation rate of Ti and Si targets. The structure was investigated by X-ray diffraction (XRD) and the morphology and surface roughness were measured by atomic force microscopy (AFM). The results show that the morphology and surface roughness reflect the structural evolution. The crystalline nature of Ti-Si thin films tends to nanocrystalline form. Higher amounts of Si resulted in an amorphous structure with a smoothed surface morphology and the lowest roughness.
Klasifikace
Druh
O - Ostatní výsledky
CEP obor
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OECD FORD obor
20506 - Coating and films
Návaznosti výsledku
Projekt
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Návaznosti
S - Specificky vyzkum na vysokych skolach
Ostatní
Rok uplatnění
2025
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů