Properties of TiSi-N films prepared by magnetron co-sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F99%3A00042458" target="_blank" >RIV/49777513:23520/99:00042458 - isvavai.cz</a>

Výsledek na webu

—

DOI - Digital Object Identifier

—

Jazyk výsledku

angličtina

Název v původním jazyce

Properties of TiSi-N films prepared by magnetron co-sputtering

Popis výsledku v původním jazyce

The paper reports on surface morphology, structure and microhardness of TiSi-N films formed by cosputtering from two target-facing unbalanced magnetrons, equipped with pure Ti and Si targets, on an unheated substrate rotating in front of both targets. Thratio Si/Ti in the TiSi-N film was controlled by the magnitude of currents in the individual magnetrons and by the addition of nitrogen to the film. The rotation of the substrate has a strong effect on the deposition rate and the film morphology. The hardness of the film increases with increasing Si content. An incorporation of nitrogen in to the TiSi film also increases the film hardness. A main finding is that the microhardness strongly correlates to the film structure. The Si content in the TiSi-Nfilm has not to be a dominant parameter which ensures a maximum hardness. The Ti(26at.%)Si(8.5at.%)N(65at.%)-film sputtered on an unheated rotating steel substrate, held at a floating potential, exhibited the best results with a hardness of

Název v anglickém jazyce

Properties of TiSi-N films prepared by magnetron co-sputtering

Popis výsledku anglicky

The paper reports on surface morphology, structure and microhardness of TiSi-N films formed by cosputtering from two target-facing unbalanced magnetrons, equipped with pure Ti and Si targets, on an unheated substrate rotating in front of both targets. Thratio Si/Ti in the TiSi-N film was controlled by the magnitude of currents in the individual magnetrons and by the addition of nitrogen to the film. The rotation of the substrate has a strong effect on the deposition rate and the film morphology. The hardness of the film increases with increasing Si content. An incorporation of nitrogen in to the TiSi film also increases the film hardness. A main finding is that the microhardness strongly correlates to the film structure. The Si content in the TiSi-Nfilm has not to be a dominant parameter which ensures a maximum hardness. The Ti(26at.%)Si(8.5at.%)N(65at.%)-film sputtered on an unheated rotating steel substrate, held at a floating potential, exhibited the best results with a hardness of

Druh

C - Kapitola v odborné knize

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

1999

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název knihy nebo sborníku

Properties of TiSi-N films prepared by magnetron co-sputtering

ISBN

8090272401

Počet stran výsledku

6

Strana od-do

—

Počet stran knihy

—

Název nakladatele

AV ČR

Místo vydání

Praha

Kód UT WoS kapitoly

—