Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F11%3A00184416" target="_blank" >RIV/68407700:21230/11:00184416 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2011.04.071" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2011.04.071</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2011.04.071" target="_blank" >10.1016/j.surfcoat.2011.04.071</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Popis výsledku v původním jazyce

The effect of peak power in a high power impulse magnetron sputtering (HiPIMS) reactive deposition of TiO2 films has been studied with respect to the deposition rate and coating properties. With increasing peak power not only the ionization of the sputtered material increases but also their energy. In order to correlate the variation in the ion energy distributions with the film properties, the phase composition, density and optical properties of the films grown with different HiPIMS-parameters have been investigated and compared to a film grown using direct current magnetron sputtering (DCMS). All experiments were performed for constant average power and pulse on time (100W and 35 ?s, respectively), different peak powers were achieved by varying the frequency of pulsing. Ion energy distributions for Ti and O and its dependence on the process conditions have been studied.

Název v anglickém jazyce

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Popis výsledku anglicky

The effect of peak power in a high power impulse magnetron sputtering (HiPIMS) reactive deposition of TiO2 films has been studied with respect to the deposition rate and coating properties. With increasing peak power not only the ionization of the sputtered material increases but also their energy. In order to correlate the variation in the ion energy distributions with the film properties, the phase composition, density and optical properties of the films grown with different HiPIMS-parameters have been investigated and compared to a film grown using direct current magnetron sputtering (DCMS). All experiments were performed for constant average power and pulse on time (100W and 35 ?s, respectively), different peak powers were achieved by varying the frequency of pulsing. Ion energy distributions for Ti and O and its dependence on the process conditions have been studied.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JI - Kompositní materiály

OECD FORD obor

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Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface & Coatings Technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

205

Číslo periodika v rámci svazku

20

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

4

Strana od-do

4828-4831

Kód UT WoS článku

000292361400013

EID výsledku v databázi Scopus

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