Comparison of Silicon Nanocrystals Prepared by Two Fundamentally Different Methods

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F16%3A00304178" target="_blank" >RIV/68407700:21230/16:00304178 - isvavai.cz</a>

Výsledek na webu

<a href="https://nanoscalereslett.springeropen.com/articles/10.1186/s11671-016-1655-7" target="_blank" >https://nanoscalereslett.springeropen.com/articles/10.1186/s11671-016-1655-7</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1186/s11671-016-1655-7" target="_blank" >10.1186/s11671-016-1655-7</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Comparison of Silicon Nanocrystals Prepared by Two Fundamentally Different Methods

Popis výsledku v původním jazyce

This work compares structural and optical properties of silicon nanocrystals prepared by two fundamentally different methods, namely, electrochemical etching of Si wafers and low-pressure plasma synthesis, completed with a mechano-photo-chemical treatment. This treatment leads to surface passivation of the nanoparticles by methyl groups. Plasma synthesis unlike electrochemical etching allows selecting of the particle sizes. Measured sizes of the nanoparticles by dynamic light scattering show 3 and 20 nm for electrochemically etched and plasma-synthetized samples, respectively. Electrochemically etched sample exhibits dramatic changes in photoluminescence during the mechano-photo-chemical treatment while no photoluminescence is observed for the plasma-synthetized one. We also used the Fourier transform infrared spectroscopy for comparison of the chemical changes happened during the treatment.

Název v anglickém jazyce

Comparison of Silicon Nanocrystals Prepared by Two Fundamentally Different Methods

Popis výsledku anglicky

This work compares structural and optical properties of silicon nanocrystals prepared by two fundamentally different methods, namely, electrochemical etching of Si wafers and low-pressure plasma synthesis, completed with a mechano-photo-chemical treatment. This treatment leads to surface passivation of the nanoparticles by methyl groups. Plasma synthesis unlike electrochemical etching allows selecting of the particle sizes. Measured sizes of the nanoparticles by dynamic light scattering show 3 and 20 nm for electrochemically etched and plasma-synthetized samples, respectively. Electrochemically etched sample exhibits dramatic changes in photoluminescence during the mechano-photo-chemical treatment while no photoluminescence is observed for the plasma-synthetized one. We also used the Fourier transform infrared spectroscopy for comparison of the chemical changes happened during the treatment.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Nanoscale Research Letters

ISSN

1931-7573

e-ISSN

—

Svazek periodika

11

Číslo periodika v rámci svazku

10

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

445

Strana od-do

—

Kód UT WoS článku

000391794100003

EID výsledku v databázi Scopus

2-s2.0-84989295918