Phototribology: Control of Friction by Light

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F21%3A00351652" target="_blank" >RIV/68407700:21230/21:00351652 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1021/acsami.1c13054" target="_blank" >https://doi.org/10.1021/acsami.1c13054</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1021/acsami.1c13054" target="_blank" >10.1021/acsami.1c13054</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Phototribology: Control of Friction by Light

Popis výsledku v původním jazyce

In dry sliding, the coefficient of friction depends on the material pair and contact conditions. If the material and operating conditions remain unchanged, the coefficient of friction is constant. Obviously, we can tune friction by surface treatments, but it is a nonreversible process. Here, we report active control of friction forces on TiO2 thin films under UV light. It is reversible and stable and can be tuned/controlled with the light wavelength. The analysis of atomic force microscopy signals by wavelet spectrograms reveals different mechanisms acting in the darkness and under UV. Ab initio simulations on UV light-exposed TiO2 show a lower atomic orbital overlapping on the surface, which leads to a friction reduction of up to 60%. We suggest that photocontrol of friction is due to the modification of atomic orbital interactions from both surfaces at the sliding interface.

Název v anglickém jazyce

Phototribology: Control of Friction by Light

Popis výsledku anglicky

In dry sliding, the coefficient of friction depends on the material pair and contact conditions. If the material and operating conditions remain unchanged, the coefficient of friction is constant. Obviously, we can tune friction by surface treatments, but it is a nonreversible process. Here, we report active control of friction forces on TiO2 thin films under UV light. It is reversible and stable and can be tuned/controlled with the light wavelength. The analysis of atomic force microscopy signals by wavelet spectrograms reveals different mechanisms acting in the darkness and under UV. Ab initio simulations on UV light-exposed TiO2 show a lower atomic orbital overlapping on the surface, which leads to a friction reduction of up to 60%. We suggest that photocontrol of friction is due to the modification of atomic orbital interactions from both surfaces at the sliding interface.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

<a href="/cs/project/EF16_026%2F0008396" target="_blank" >EF16_026/0008396: Nové nanostruktury pro inženýrské aplikace umožněné kombinací moderních technologií a pokročilých simulací</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

ACS Applied Materials & Interfaces

ISSN

1944-8244

e-ISSN

1944-8252

Svazek periodika

13

Číslo periodika v rámci svazku

36

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

9

Strana od-do

43746-43754

Kód UT WoS článku

000697282300135

EID výsledku v databázi Scopus

2-s2.0-85115619605