Advanced matrix laser lithography for fabrication of photonic micro-structures

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F12%3A00203837" target="_blank" >RIV/68407700:21340/12:00203837 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.2971/jeos.2012.12043" target="_blank" >http://dx.doi.org/10.2971/jeos.2012.12043</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.2971/jeos.2012.12043" target="_blank" >10.2971/jeos.2012.12043</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Advanced matrix laser lithography for fabrication of photonic micro-structures

Popis výsledku v původním jazyce

Direct laser beam writing techniques represent an interesting alternative to focused electron and ion beam writing approaches for the fabrication of photonic micro-structures. Although the resolution of laser beam writers is strongly limited by the Rayleigh diffraction limit, it is not always necessary to create features significantly smaller than the recording wavelength. In such cases, a laser exposure can be used, with all its advantages. In this paper a direct laser writing technique is presented one; which significantly improves the performance of commonly used direct laser writers by introducing an exposure of a large area within a single step. The elementary exposed area can contain a general micro-structure without any special requirements. Incontrast to writing techniques based on a single spot focus, the writing beam can have the shape of a general aperiodic structure and exposes an area of about 10-2 square millimetre. This complicated exposure field is created using a dema

Název v anglickém jazyce

Advanced matrix laser lithography for fabrication of photonic micro-structures

Popis výsledku anglicky

Direct laser beam writing techniques represent an interesting alternative to focused electron and ion beam writing approaches for the fabrication of photonic micro-structures. Although the resolution of laser beam writers is strongly limited by the Rayleigh diffraction limit, it is not always necessary to create features significantly smaller than the recording wavelength. In such cases, a laser exposure can be used, with all its advantages. In this paper a direct laser writing technique is presented one; which significantly improves the performance of commonly used direct laser writers by introducing an exposure of a large area within a single step. The elementary exposed area can contain a general micro-structure without any special requirements. Incontrast to writing techniques based on a single spot focus, the writing beam can have the shape of a general aperiodic structure and exposes an area of about 10-2 square millimetre. This complicated exposure field is created using a dema

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

<a href="/cs/project/KAN401220801" target="_blank" >KAN401220801: Příprava nanostruktur a nanomaterialů s cíleným řízením rozměrů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of the European Optical Society Rapid Publication

ISSN

1990-2573

e-ISSN

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Svazek periodika

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Číslo periodika v rámci svazku

7

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

8

Strana od-do

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Kód UT WoS článku

000310570500001

EID výsledku v databázi Scopus

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