Fabrication of synthetic diffractive elements using advanced matrix laser lithography

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F12%3A00203989" target="_blank" >RIV/68407700:21340/12:00203989 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Fabrication of synthetic diffractive elements using advanced matrix laser lithography

Popis výsledku v původním jazyce

A laser writing technique for fabrication of diffractive and photonic structures is presented, which is based on a computer driven matrix exposure of a recording material. In contrast to the commonly used laser writing techniques, a relatively large areais exposed within a single exposure step, which ensures a high speed of the writing process. The exposed micro-structure is projected from a computer driven spatial light modulator with high resolution on a recording material with strong demagnification. The mechanically passive projection ensures high precision of the writing process, which is limited only by the Rayleigh diffraction limit. When multiple exposures of the same area are used, complicated micro-structures can be prepared. The device constructed on the described basis will be presented together with different samples prepared using this technology. Selected applications of the elements will be also mentioned.

Název v anglickém jazyce

Fabrication of synthetic diffractive elements using advanced matrix laser lithography

Popis výsledku anglicky

A laser writing technique for fabrication of diffractive and photonic structures is presented, which is based on a computer driven matrix exposure of a recording material. In contrast to the commonly used laser writing techniques, a relatively large areais exposed within a single exposure step, which ensures a high speed of the writing process. The exposed micro-structure is projected from a computer driven spatial light modulator with high resolution on a recording material with strong demagnification. The mechanically passive projection ensures high precision of the writing process, which is limited only by the Rayleigh diffraction limit. When multiple exposures of the same area are used, complicated micro-structures can be prepared. The device constructed on the described basis will be presented together with different samples prepared using this technology. Selected applications of the elements will be also mentioned.

Druh

D - Stať ve sborníku

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

<a href="/cs/project/KAN401220801" target="_blank" >KAN401220801: Příprava nanostruktur a nanomaterialů s cíleným řízením rozměrů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Conference Proceedings - Optics and Measurement International conference 2012

ISBN

978-80-87026-02-1

ISSN

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e-ISSN

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Počet stran výsledku

5

Strana od-do

124-128

Název nakladatele

Institute of Plasma Physics AS CR, v.v.i.

Místo vydání

Prague

Místo konání akce

Liberec

Datum konání akce

16. 10. 2012

Typ akce podle státní příslušnosti

EUR - Evropská akce

Kód UT WoS článku

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