Fabrication of diffractive elements using matrix laser lithography

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F13%3A00215709" target="_blank" >RIV/68407700:21340/13:00215709 - isvavai.cz</a>

Výsledek na webu

<a href="http://www.epj-conferences.org/articles/epjconf/pdf/2013/09/epjconf_OAM2012_00023.pdf" target="_blank" >http://www.epj-conferences.org/articles/epjconf/pdf/2013/09/epjconf_OAM2012_00023.pdf</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1051/epjconf/20134800023" target="_blank" >10.1051/epjconf/20134800023</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Fabrication of diffractive elements using matrix laser lithography

Popis výsledku v původním jazyce

In this paper, a laser writing technique for fabrication of diffractive and photonic structures is presented, which is based on a computer driven matrix exposure of a recording material. In contrast to the commonly used laser writing techniques, a relatively large area is exposed within a single exposure step, which ensures a high speed of the writing process. The exposed micro-structure is projected from a computer driven spatial light modulator with high resolution on a recording material with strongdemagnification. The mechanically passive projection ensures high precision of the writing process, which is limited only by the Rayleigh diffraction limit. When multiple exposures of the same area are used, complicated micro-structures can be prepared.The device constructed on the described basis will be presented together with different samples prepared using this technology. Selected applications of the elements will be also mentioned.

Název v anglickém jazyce

Fabrication of diffractive elements using matrix laser lithography

Popis výsledku anglicky

In this paper, a laser writing technique for fabrication of diffractive and photonic structures is presented, which is based on a computer driven matrix exposure of a recording material. In contrast to the commonly used laser writing techniques, a relatively large area is exposed within a single exposure step, which ensures a high speed of the writing process. The exposed micro-structure is projected from a computer driven spatial light modulator with high resolution on a recording material with strongdemagnification. The mechanically passive projection ensures high precision of the writing process, which is limited only by the Rayleigh diffraction limit. When multiple exposures of the same area are used, complicated micro-structures can be prepared.The device constructed on the described basis will be presented together with different samples prepared using this technology. Selected applications of the elements will be also mentioned.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JA - Elektronika a optoelektronika, elektrotechnika

OECD FORD obor

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Projekt

<a href="/cs/project/KAN401220801" target="_blank" >KAN401220801: Příprava nanostruktur a nanomaterialů s cíleným řízením rozměrů</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

EPJ Web of Conferences

ISSN

2100-014X

e-ISSN

—

Svazek periodika

48

Číslo periodika v rámci svazku

48

Stát vydavatele periodika

FR - Francouzská republika

Počet stran výsledku

5

Strana od-do

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Kód UT WoS článku

000326985500022

EID výsledku v databázi Scopus

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