Hydrogen storage in Ti-TiO 2 multilayers

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F13%3A10190410" target="_blank" >RIV/00216208:11320/13:10190410 - isvavai.cz</a>

Výsledek na webu

<a href="http://iopscience.iop.org/2043-6262/4/2/025004/" target="_blank" >http://iopscience.iop.org/2043-6262/4/2/025004/</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/2043-6262/4/2/025004" target="_blank" >10.1088/2043-6262/4/2/025004</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Hydrogen storage in Ti-TiO 2 multilayers

Popis výsledku v původním jazyce

Multilayered thin films of Ti-TiO 2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO 2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O 2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO 2 films. H charging at 1 bar and at 300 oC revealed that, in the case of the tri-layered structure of Ti/TiO 2 /Ti/Si(111), H diffused through the TiO 2 layer without any accumulation in it. Pd acts as a

Název v anglickém jazyce

Hydrogen storage in Ti-TiO 2 multilayers

Popis výsledku anglicky

Multilayered thin films of Ti-TiO 2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO 2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O 2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO 2 films. H charging at 1 bar and at 300 oC revealed that, in the case of the tri-layered structure of Ti/TiO 2 /Ti/Si(111), H diffused through the TiO 2 layer without any accumulation in it. Pd acts as a

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

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Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Advances in Natural Sciences: Nanoscience and Nanotechnology

ISSN

2043-6262

e-ISSN

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Svazek periodika

4

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

11

Strana od-do

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Kód UT WoS článku

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EID výsledku v databázi Scopus

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