AlN/Fe/AlN nanostructures for magnetooptic magnetometry

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F14%3A10288854" target="_blank" >RIV/00216208:11320/14:10288854 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1063/1.4868490" target="_blank" >http://dx.doi.org/10.1063/1.4868490</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.4868490" target="_blank" >10.1063/1.4868490</a>

Jazyk výsledku

angličtina

Název v původním jazyce

AlN/Fe/AlN nanostructures for magnetooptic magnetometry

Popis výsledku v původním jazyce

AlN/Fe/AlN/Cu nanostructures with ultrathin Fe grown by sputtering on Si substrates are evaluated as probes for magnetooptical (MO) mapping of weak currents. They are considered for a laser wavelength of lambda = 410 nm (3.02 eV) and operate at oblique light incidence angles, phi((0)), to enable detection of both in-plane and out-of-plane magnetization. Their performance is evaluated in terms of MO reflected wave electric field amplitudes. The maximal MO amplitudes in AlN/Fe/AlN/Cu are achieved by a proper choice of layer thicknesses. The nanostructures were characterized by MO polar Kerr effect at phi((0)) approximate to 5 degrees and longitudinal Kerr effect spectra (phi((0)) = 45 degrees) at photon energies between 1 and 5 eV. The nominal profiles were refined using a model-based analysis of the spectra. Closed form analytical expressions are provided, which are useful in the search for maximal MO amplitudes. (C) 2014 AIP Publishing LLC.

Název v anglickém jazyce

AlN/Fe/AlN nanostructures for magnetooptic magnetometry

Popis výsledku anglicky

AlN/Fe/AlN/Cu nanostructures with ultrathin Fe grown by sputtering on Si substrates are evaluated as probes for magnetooptical (MO) mapping of weak currents. They are considered for a laser wavelength of lambda = 410 nm (3.02 eV) and operate at oblique light incidence angles, phi((0)), to enable detection of both in-plane and out-of-plane magnetization. Their performance is evaluated in terms of MO reflected wave electric field amplitudes. The maximal MO amplitudes in AlN/Fe/AlN/Cu are achieved by a proper choice of layer thicknesses. The nanostructures were characterized by MO polar Kerr effect at phi((0)) approximate to 5 degrees and longitudinal Kerr effect spectra (phi((0)) = 45 degrees) at photon energies between 1 and 5 eV. The nominal profiles were refined using a model-based analysis of the spectra. Closed form analytical expressions are provided, which are useful in the search for maximal MO amplitudes. (C) 2014 AIP Publishing LLC.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

—

Projekt

<a href="/cs/project/GAP205%2F11%2F2137" target="_blank" >GAP205/11/2137: Magnetofotonické interakce v reálných nanostrukturách</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

—

Svazek periodika

115

Číslo periodika v rámci svazku

17

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

3

Strana od-do

"17A937"-1

Kód UT WoS článku

000335643700181

EID výsledku v databázi Scopus

—