Oxidation behavior of Cu nanoparticles embedded into semiconductive TiO2 matrix

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319610" target="_blank" >RIV/00216208:11320/15:10319610 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/60076658:12310/15:43888689 RIV/68378271:_____/15:00510812

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.tsf.2015.07.026" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2015.07.026</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2015.07.026" target="_blank" >10.1016/j.tsf.2015.07.026</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Oxidation behavior of Cu nanoparticles embedded into semiconductive TiO2 matrix

Popis výsledku v původním jazyce

Metal nanoparticles embedded into a semiconductive matrix represent a promising material for widely sought advanced technological applications. We focused our interest on the preparation of TiO2 matrix with embedded Cu nanoparticles. In particular, we studied the effect of reactive discharge (Ar/O-2) exposition on copper oxidation, which can result in two stable forms: cuprous oxide (Cu2O) and cupric oxide (CuO). Copper nanoparticles, of size in range 10-50 nm, were produced by magnetron sputtering in combination with gas aggregation. The beam of Cu nanoparticles was impinging onto a silicon substrate which was directly exposed to a reactive Ar/O-2 magnetron discharge providing sputtering of Ti target at the same time. The properties of deposited nanocomposite Cu(O-x)-TiO2 were investigated by X-ray photoelectron spectroscopy, grazing incidence X-ray diffractometry, X-ray reflectometry and scanning electron microscopy techniques to reveal the nanocomposite properties and to understand

Název v anglickém jazyce

Oxidation behavior of Cu nanoparticles embedded into semiconductive TiO2 matrix

Popis výsledku anglicky

Metal nanoparticles embedded into a semiconductive matrix represent a promising material for widely sought advanced technological applications. We focused our interest on the preparation of TiO2 matrix with embedded Cu nanoparticles. In particular, we studied the effect of reactive discharge (Ar/O-2) exposition on copper oxidation, which can result in two stable forms: cuprous oxide (Cu2O) and cupric oxide (CuO). Copper nanoparticles, of size in range 10-50 nm, were produced by magnetron sputtering in combination with gas aggregation. The beam of Cu nanoparticles was impinging onto a silicon substrate which was directly exposed to a reactive Ar/O-2 magnetron discharge providing sputtering of Ti target at the same time. The properties of deposited nanocomposite Cu(O-x)-TiO2 were investigated by X-ray photoelectron spectroscopy, grazing incidence X-ray diffractometry, X-ray reflectometry and scanning electron microscopy techniques to reveal the nanocomposite properties and to understand

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

<a href="/cs/project/GAP108%2F12%2F2104" target="_blank" >GAP108/12/2104: Pokročilé polovodičové materiály pro fotoelektrochemický rozklad vody</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Svazek periodika

589

Číslo periodika v rámci svazku

Aug

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

864-871

Kód UT WoS článku

000360320000136

EID výsledku v databázi Scopus

2-s2.0-84940062502