Computer Simulation of Metal Ions Transport to Uneven Substrates during Ionized Plasma Vapour Deposition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F17%3A10371526" target="_blank" >RIV/00216208:11320/17:10371526 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1155/2017/4283547" target="_blank" >http://dx.doi.org/10.1155/2017/4283547</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1155/2017/4283547" target="_blank" >10.1155/2017/4283547</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Computer Simulation of Metal Ions Transport to Uneven Substrates during Ionized Plasma Vapour Deposition

Popis výsledku v původním jazyce

We present a computational study of processes taking place in a sheath region formed near a negatively biased uneven substrate during ionized plasma vapour deposition. The sputtered metal atoms are ionized on their way to substrate and they are accelerated in the sheath near the substrate. They are able to penetrate to high-aspect-ratio structures, for example, trenches, which can be, therefore, effectively coated. The main technique used was a two-dimensional particle simulation. The results of our model predict the energy and angular distributions of impinging ions in low-pressure conditions which are characteristic for this method and where typical continuous models fail due to unfulfilled assumptions. Input bulk plasma properties were computed by a &quot;zero dimensional&quot; global model which took into account more physical processes important on a scale of the whole magnetron chamber. Output parameters, such as electrostatic potential, energy of ions, and ion fluxes, were computed for wide range of conditions (electron density and substrate bias) to show the influence of these conditions on observed phenomena, penetration of sheath inside the trench, deceleration of argon and copper ions inside the trench, and local maxima of ion fluxes near the trench opening.

Název v anglickém jazyce

Computer Simulation of Metal Ions Transport to Uneven Substrates during Ionized Plasma Vapour Deposition

Popis výsledku anglicky

We present a computational study of processes taking place in a sheath region formed near a negatively biased uneven substrate during ionized plasma vapour deposition. The sputtered metal atoms are ionized on their way to substrate and they are accelerated in the sheath near the substrate. They are able to penetrate to high-aspect-ratio structures, for example, trenches, which can be, therefore, effectively coated. The main technique used was a two-dimensional particle simulation. The results of our model predict the energy and angular distributions of impinging ions in low-pressure conditions which are characteristic for this method and where typical continuous models fail due to unfulfilled assumptions. Input bulk plasma properties were computed by a &quot;zero dimensional&quot; global model which took into account more physical processes important on a scale of the whole magnetron chamber. Output parameters, such as electrostatic potential, energy of ions, and ion fluxes, were computed for wide range of conditions (electron density and substrate bias) to show the influence of these conditions on observed phenomena, penetration of sheath inside the trench, deceleration of argon and copper ions inside the trench, and local maxima of ion fluxes near the trench opening.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

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OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

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Návaznosti

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Advances in Materials Science and Engineering

ISSN

1687-8434

e-ISSN

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Svazek periodika

2017

Číslo periodika v rámci svazku

18. října

Stát vydavatele periodika

EG - Egyptská arabská republika

Počet stran výsledku

7

Strana od-do

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Kód UT WoS článku

000414084900001

EID výsledku v databázi Scopus

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