Chamber with inverted electrode geometry for measuring and control of ion flux-energy distribution functions

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00567159" target="_blank" >RIV/68378271:_____/22:00567159 - isvavai.cz</a>

Výsledek na webu

<a href="https://hdl.handle.net/11104/0338436" target="_blank" >https://hdl.handle.net/11104/0338436</a>

DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Chamber with inverted electrode geometry for measuring and control of ion flux-energy distribution functions

Popis výsledku v původním jazyce

Measurements of the ion flux-energy distribution functions with an energy-selective mass spectrometer at the high sheath potential of the grounded electrode are presented for a variety of conditions and ions. The potential for suppressing low-energy ions from resonant charge transfer collisions in the sheath by the dilution of the working gas is demonstrated. Additionally, the setup is supplemented by an inductively coupled plasma that controls the plasma density and consequently the ion flux to the substrate while the radio frequency bias controls the ion energy. At high ion energies, metal ions are detected as a consequence of the ionization of sputtered electrode material. The proposed setup opens a way to study precisely the effects of ion treatment for a variety of substrates such as catalysts, polymers, or thin films.

Název v anglickém jazyce

Chamber with inverted electrode geometry for measuring and control of ion flux-energy distribution functions

Popis výsledku anglicky

Measurements of the ion flux-energy distribution functions with an energy-selective mass spectrometer at the high sheath potential of the grounded electrode are presented for a variety of conditions and ions. The potential for suppressing low-energy ions from resonant charge transfer collisions in the sheath by the dilution of the working gas is demonstrated. Additionally, the setup is supplemented by an inductively coupled plasma that controls the plasma density and consequently the ion flux to the substrate while the radio frequency bias controls the ion energy. At high ion energies, metal ions are detected as a consequence of the ionization of sputtered electrode material. The proposed setup opens a way to study precisely the effects of ion treatment for a variety of substrates such as catalysts, polymers, or thin films.

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

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Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů