Characterization of an unballanced magnetron for composite film (metal/C:H) deposition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F99%3A11110005" target="_blank" >RIV/00216208:11320/99:11110005 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Characterization of an unballanced magnetron for composite film (metal/C:H) deposition

Popis výsledku v původním jazyce

In this paper, plasma parameters of a DC unbalanced planar magnetron applied for Mo/C:H composite film deposition are described in connection with the basic film properties. Langmuir probe (of a V shape) heated to a dark red was used for V A characteristic measurements in Ar and in a mixture of Ar and n-hexane as working gases. Floating and plasma potentials, electron temperature and concentrations were measured. Using a cold plane Langmuir electrostatic probe in the form of a small disc theradial distribution of a plasma potential and saturated ion current to the probe were determined. Using a thermocouple probe spot welded to the disc probe a heat load in the substrate plane was investigated. Also the dependence of the floating potential floating potential on pressure of the working gas and substrate temperature on the power delivered to the discharge were found. Finally, radial distribution of the composite film resistance per square and film thickness were measured and discussed.

Název v anglickém jazyce

Characterization of an unballanced magnetron for composite film (metal/C:H) deposition

Popis výsledku anglicky

In this paper, plasma parameters of a DC unbalanced planar magnetron applied for Mo/C:H composite film deposition are described in connection with the basic film properties. Langmuir probe (of a V shape) heated to a dark red was used for V A characteristic measurements in Ar and in a mixture of Ar and n-hexane as working gases. Floating and plasma potentials, electron temperature and concentrations were measured. Using a cold plane Langmuir electrostatic probe in the form of a small disc theradial distribution of a plasma potential and saturated ion current to the probe were determined. Using a thermocouple probe spot welded to the disc probe a heat load in the substrate plane was investigated. Also the dependence of the floating potential floating potential on pressure of the working gas and substrate temperature on the power delivered to the discharge were found. Finally, radial distribution of the composite film resistance per square and film thickness were measured and discussed.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/ME%20177" target="_blank" >ME 177: Fyzika povrchu modifikovaných svazků ionizovaných klastrů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

1999

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum.:Technology, applications and ion physics

ISSN

0042-207X

e-ISSN

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Svazek periodika

52

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

6

Strana od-do

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Kód UT WoS článku

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EID výsledku v databázi Scopus

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