Prostorově rozlišené měření v rf kapacitním výboji v argonu a dusíku

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F04%3A00010149" target="_blank" >RIV/00216224:14310/04:00010149 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Spatially resolved measurements in r.f. capacitive discharges in argon and nitrogen

Popis výsledku v původním jazyce

Plasma potential, electron concentration and IED collected by grounded surface were measured in Ar and nitrogen capacitively coupled r.f. discharges. Langmuir probe and Balzers Plasma Process Monitor (PPM 421), oriented parallel to the movable electrodesallowing a perpendicular spatially resolved measurements. The asymmetry of capacitive coupling estimated from the plasma potential and d.c. self-bias increase for increasing power since the discharge extended towards the grounded PPM orifice, its tubular housing as well as chamber walls. The IEDs measured with PPM reflected the situation at the grounded electrode. It exhibited only one peak which was typically found for low voltage modulated r.f. sheaths. The mean energy of ions depends on their mean free paths. This can be explained by collisions in the sheath. The ion mean energies decreased towards the grounded electrodes in agreement with the plasma potential. The ion and electron concentrations showed similar profiles.

Název v anglickém jazyce

Spatially resolved measurements in r.f. capacitive discharges in argon and nitrogen

Popis výsledku anglicky

Plasma potential, electron concentration and IED collected by grounded surface were measured in Ar and nitrogen capacitively coupled r.f. discharges. Langmuir probe and Balzers Plasma Process Monitor (PPM 421), oriented parallel to the movable electrodesallowing a perpendicular spatially resolved measurements. The asymmetry of capacitive coupling estimated from the plasma potential and d.c. self-bias increase for increasing power since the discharge extended towards the grounded PPM orifice, its tubular housing as well as chamber walls. The IEDs measured with PPM reflected the situation at the grounded electrode. It exhibited only one peak which was typically found for low voltage modulated r.f. sheaths. The mean energy of ions depends on their mean free paths. This can be explained by collisions in the sheath. The ion mean energies decreased towards the grounded electrodes in agreement with the plasma potential. The ion and electron concentrations showed similar profiles.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2004

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Czech. J. Phys.

ISSN

0011-4626

e-ISSN

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Svazek periodika

54/2004

Číslo periodika v rámci svazku

Suppl. C

Stát vydavatele periodika

CZ - Česká republika

Počet stran výsledku

7

Strana od-do

592-598

Kód UT WoS článku

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EID výsledku v databázi Scopus

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