Monte Carlo a Particle in Cell simulace zrcadlového jevu v PECVD reaktoru

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F04%3A00011745" target="_blank" >RIV/00216224:14310/04:00011745 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Monte Carlo and Particle in Cell Simulation of Mirror Effect in PECVD reactor

Popis výsledku v původním jazyce

We have studied thin film plasma enhanced chemical vapor deposition from methane and thin film sputtering in argon in low pressure rf discharge. We have observed that thickness of a thin film deposited on the upper (grounded) electrode has mirrored substrates placed on the bottom rf powered electrode. This mirror images have not been quite sharp. The same effect was observed when the initially homogeneous film (deposited on the upper electrode) was sputtered in the argon plasma. Again the image of object on the bottom electrode was sputtered in the film on the upper electrode. The mirror effect has been studied via Particle In Cell - Monte Carlo (PIC-MC) computer simulation. In our explanation the mirror effect is caused by the difference between secondary electron emission coefficient of substrate material and material of substrate holder. This difference in the secondary electron emission coefficient affects plasma density upon the substrates and this leads to higher or lower deposit

Název v anglickém jazyce

Monte Carlo and Particle in Cell Simulation of Mirror Effect in PECVD reactor

Popis výsledku anglicky

We have studied thin film plasma enhanced chemical vapor deposition from methane and thin film sputtering in argon in low pressure rf discharge. We have observed that thickness of a thin film deposited on the upper (grounded) electrode has mirrored substrates placed on the bottom rf powered electrode. This mirror images have not been quite sharp. The same effect was observed when the initially homogeneous film (deposited on the upper electrode) was sputtered in the argon plasma. Again the image of object on the bottom electrode was sputtered in the film on the upper electrode. The mirror effect has been studied via Particle In Cell - Monte Carlo (PIC-MC) computer simulation. In our explanation the mirror effect is caused by the difference between secondary electron emission coefficient of substrate material and material of substrate holder. This difference in the secondary electron emission coefficient affects plasma density upon the substrates and this leads to higher or lower deposit

Druh

D - Stať ve sborníku

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GA202%2F03%2F0827" target="_blank" >GA202/03/0827: Studium elementárních procesů v nízkoteplotním a technologicky orientovaném plazmatu a vývoj relevantních diagnostických metod</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2004

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

WDS'04 Proceedings of Contributed Papers, Part II

ISBN

80-86732-32-0

ISSN

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e-ISSN

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Počet stran výsledku

6

Strana od-do

287-292

Název nakladatele

MATFYZPRESS

Místo vydání

Prague, (Czech republic)

Místo konání akce

Prague

Datum konání akce

15. 6. 2004

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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