Dynamika UV degradace PMPSi ve vakuu a na vzduchu s využitím in-situ elipsometrie

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F08%3A00027153" target="_blank" >RIV/00216224:14310/08:00027153 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Dynamics of UV degradation of PMPSi in vacuum and in the air using in-situ ellipsometry

Popis výsledku v původním jazyce

We present a comparative study of UV degradation of poly[methyl(phenyl)silane] (PMPSi) thin films on Si substrate in HV and in the air. When exposed to UV light with energies around 3.6 eV, the Si backbone scission occurs. The degradation rate is influenced by the presence of oxygen, which is bonded to the Si atoms following the backbone scission. In our experiments, the samples were placed in an HV chamber and ellipsometric spectra were continuously recorded in the 3.3-5.0 eV range. The combined tungsten (halogen)-deuterium source ensuring a proper level of light intensity used for both exposition and measurement. During 100 hours exposures at atmospheric pressure, the PMPSi film degraded completely and its optical response did not change further. Degradation of the sample exposed in vacuum (at the pressure of 5 x 10-6 Pa) is slower and stops earlier. Ellipsometric technique allowed us to perform detailed studies of the degradation dynamics.

Název v anglickém jazyce

Dynamics of UV degradation of PMPSi in vacuum and in the air using in-situ ellipsometry

Popis výsledku anglicky

We present a comparative study of UV degradation of poly[methyl(phenyl)silane] (PMPSi) thin films on Si substrate in HV and in the air. When exposed to UV light with energies around 3.6 eV, the Si backbone scission occurs. The degradation rate is influenced by the presence of oxygen, which is bonded to the Si atoms following the backbone scission. In our experiments, the samples were placed in an HV chamber and ellipsometric spectra were continuously recorded in the 3.3-5.0 eV range. The combined tungsten (halogen)-deuterium source ensuring a proper level of light intensity used for both exposition and measurement. During 100 hours exposures at atmospheric pressure, the PMPSi film degraded completely and its optical response did not change further. Degradation of the sample exposed in vacuum (at the pressure of 5 x 10-6 Pa) is slower and stops earlier. Ellipsometric technique allowed us to perform detailed studies of the degradation dynamics.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

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Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2008

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

physica status solidi (c)

ISSN

1610-1642

e-ISSN

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Svazek periodika

5

Číslo periodika v rámci svazku

5

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

4

Strana od-do

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Kód UT WoS článku

000256862500063

EID výsledku v databázi Scopus

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