Optimization of UV curing: Effect of wavelength on critical properties of low-k dielectrics

Kód výsledku v IS VaVaI

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Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Optimization of UV curing: Effect of wavelength on critical properties of low-k dielectrics

Popis výsledku v původním jazyce

The results of recent investigations show that after UV curing of CVD SiCOH low-k films deposited with organic material (porogen) some amount of the porogen remains in the cured films in the form of non-volatile graphitized phase, known as porogen residue. These residues could influence leakage current and reliability. The goal of the present work is investigation of the different parameters of UV curing that can influence amount of the porogen residue. In this work we focused generally on the study ofthe amount of porogen residues as function of the wavelength of curing light and the porosity of the material (amount of deposited porogen). To study the curing dependence on the wavelength, we compared optical properties (measured by spectroscopic ellipsometry) and IR adsorption (measured by FTIR) of samples cured by 172 nm monochromatic light (lamp A) with samples cured by broadband source with wavelength more than 200 nm (lamp B).

Název v anglickém jazyce

Optimization of UV curing: Effect of wavelength on critical properties of low-k dielectrics

Popis výsledku anglicky

The results of recent investigations show that after UV curing of CVD SiCOH low-k films deposited with organic material (porogen) some amount of the porogen remains in the cured films in the form of non-volatile graphitized phase, known as porogen residue. These residues could influence leakage current and reliability. The goal of the present work is investigation of the different parameters of UV curing that can influence amount of the porogen residue. In this work we focused generally on the study ofthe amount of porogen residues as function of the wavelength of curing light and the porosity of the material (amount of deposited porogen). To study the curing dependence on the wavelength, we compared optical properties (measured by spectroscopic ellipsometry) and IR adsorption (measured by FTIR) of samples cured by 172 nm monochromatic light (lamp A) with samples cured by broadband source with wavelength more than 200 nm (lamp B).

Druh

D - Stať ve sborníku

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

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Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2009

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Materials Research Society Symposium Proceedings

ISBN

978-1-60511-129-2

ISSN

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e-ISSN

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Počet stran výsledku

6

Strana od-do

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Název nakladatele

Materials Research Society

Místo vydání

Warrendale

Místo konání akce

San Francisco

Datum konání akce

1. 1. 2009

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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