OPTICAL PROPERTIES OF PECVD DEPOSITED DLC:N FILMS

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F10%3A00047524" target="_blank" >RIV/00216224:14310/10:00047524 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

OPTICAL PROPERTIES OF PECVD DEPOSITED DLC:N FILMS

Popis výsledku v původním jazyce

Amorphous hydrogenated carbon films can be used, besides tribological applications, in photonics. It can include such applications like antireflective coatings, photosensitive materials or thickness monitoring. The optical properties are crucial parameters for these applications, especially possible tuning of refractive index and decrease of absorption in visible. These effects can be achieved by doping with nitrogen. In this contribution, nitrogen doped diamond-like carbon films (DLC:N) were depositedon silicon substrates by plasma enhanced chemical vapor deposition (PECVD) method using a mixture of methane, hydrogen and nitrogen as reactants. Discharge was excited in capacitively coupled configuration at 13.56 MHz. The bias voltage, working pressureand temperature were changed to vary film optical properties. The optical properties of the films were investigated using UV-VIS reflectometry, ellipsometry and FTIR transmittance measurement.

Název v anglickém jazyce

OPTICAL PROPERTIES OF PECVD DEPOSITED DLC:N FILMS

Popis výsledku anglicky

Amorphous hydrogenated carbon films can be used, besides tribological applications, in photonics. It can include such applications like antireflective coatings, photosensitive materials or thickness monitoring. The optical properties are crucial parameters for these applications, especially possible tuning of refractive index and decrease of absorption in visible. These effects can be achieved by doping with nitrogen. In this contribution, nitrogen doped diamond-like carbon films (DLC:N) were depositedon silicon substrates by plasma enhanced chemical vapor deposition (PECVD) method using a mixture of methane, hydrogen and nitrogen as reactants. Discharge was excited in capacitively coupled configuration at 13.56 MHz. The bias voltage, working pressureand temperature were changed to vary film optical properties. The optical properties of the films were investigated using UV-VIS reflectometry, ellipsometry and FTIR transmittance measurement.

Druh

O - Ostatní výsledky

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GD104%2F09%2FH080" target="_blank" >GD104/09/H080: Plazmochemické procesy a jejich technologické aplikace</a><br>

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2010

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů