Diamond-Like Carbon film for protective use on glass and polymer surfaces

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F10%3A00047541" target="_blank" >RIV/00216224:14310/10:00047541 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Diamond-Like Carbon film for protective use on glass and polymer surfaces

Popis výsledku v původním jazyce

Amorphous hydrogenated carbon films can be used, besides tribological applications for optical applications. It can include antireflective coatings, photosensitive materials, scratch resistant glass and polymer surfaces. The optical properties are crucial parameters for these applications, especially possible tuning of refractive index and decrease of absorption in visible. Diamond-like carbon (amorphous hydrogenated carbon: a-C:H) films were deposited by plasma enhanced chemical vapor deposition (PECVD) using capacitively coupled rf discharge at 13.56 MHz in the mixture of methane and hydrogen on silicon and glass substrates. DC self-bias, time and gas feed composition parameters were used for modification of the optical properties, adhesion to substrates, chemical composition and structure of the deposited films. . The optical properties of the films were investigated using UV-VIS reflectometry and ellipsometry. Mechanical tests, in form of depth sensing indentation, were also perfor

Název v anglickém jazyce

Diamond-Like Carbon film for protective use on glass and polymer surfaces

Popis výsledku anglicky

Amorphous hydrogenated carbon films can be used, besides tribological applications for optical applications. It can include antireflective coatings, photosensitive materials, scratch resistant glass and polymer surfaces. The optical properties are crucial parameters for these applications, especially possible tuning of refractive index and decrease of absorption in visible. Diamond-like carbon (amorphous hydrogenated carbon: a-C:H) films were deposited by plasma enhanced chemical vapor deposition (PECVD) using capacitively coupled rf discharge at 13.56 MHz in the mixture of methane and hydrogen on silicon and glass substrates. DC self-bias, time and gas feed composition parameters were used for modification of the optical properties, adhesion to substrates, chemical composition and structure of the deposited films. . The optical properties of the films were investigated using UV-VIS reflectometry and ellipsometry. Mechanical tests, in form of depth sensing indentation, were also perfor

Druh

O - Ostatní výsledky

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GD104%2F09%2FH080" target="_blank" >GD104/09/H080: Plazmochemické procesy a jejich technologické aplikace</a><br>

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2010

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů