Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F12%3A00057674" target="_blank" >RIV/00216224:14310/12:00057674 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition

Popis výsledku v původním jazyce

Hybrid PVD-PECVD process of titanium sputtering in mixture of argon and acetylene combines aspects of both conventional techniques: sputtering of titanium target (PVD) and deposition from acetylene which acts as a source of carbon for polymerization (PECVD). This contribution reports and corelates both the properties of the deposited coating and the deposition process characteristics. nc-TiC/a-C:H coating with hardness and Young?s modulus over 40 GPa and 400 GPa respectively with adhesion in range HF0-HF1 on Ti coated HSS and WC were prepared. Hysteresis free and non-monotonous evolution of discharge voltage determines three characteristic zones of the process evolution with the acetylene supply. The evolution of discharge voltage was correlated with the evolution of the state of the target and OES. At zone I, for low acetylene supply, the discharge voltage and H line intensity increase and the initially pure Ti racetrack is getting covered by TiC.

Název v anglickém jazyce

Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition

Popis výsledku anglicky

Hybrid PVD-PECVD process of titanium sputtering in mixture of argon and acetylene combines aspects of both conventional techniques: sputtering of titanium target (PVD) and deposition from acetylene which acts as a source of carbon for polymerization (PECVD). This contribution reports and corelates both the properties of the deposited coating and the deposition process characteristics. nc-TiC/a-C:H coating with hardness and Young?s modulus over 40 GPa and 400 GPa respectively with adhesion in range HF0-HF1 on Ti coated HSS and WC were prepared. Hysteresis free and non-monotonous evolution of discharge voltage determines three characteristic zones of the process evolution with the acetylene supply. The evolution of discharge voltage was correlated with the evolution of the state of the target and OES. At zone I, for low acetylene supply, the discharge voltage and H line intensity increase and the initially pure Ti racetrack is getting covered by TiC.

Druh

O - Ostatní výsledky

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů