On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F24%3A00136403" target="_blank" >RIV/00216224:14310/24:00136403 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S0257897224006595" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0257897224006595</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2024.131028" target="_blank" >10.1016/j.surfcoat.2024.131028</a>

Jazyk výsledku

angličtina

Název v původním jazyce

On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species

Popis výsledku v původním jazyce

In the industry, there is a preference for robust and technologically straightforward solutions that can deliver desired products at reasonable costs. This study introduces a reliable, robust, and cost-effective ion-assisted thin film growth technique called moving focused magnetic field magnetron sputtering. At the core of this technology lies the generation of dense plasma within a small area of the target and the controlled movement of this plasma across the entire target surface. The deposition process, powered by a direct current generator, behaves similarly to high-power impulse magnetron sputtering and yields coatings with properties comparable to those produced by this method. Notably, this study marks the first application of an ion meter to measure the ionized metal flux fraction of sputtered titanium at industrial conditions, revealing values of up to 34% measured at the substrate position.

Název v anglickém jazyce

On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species

Popis výsledku anglicky

In the industry, there is a preference for robust and technologically straightforward solutions that can deliver desired products at reasonable costs. This study introduces a reliable, robust, and cost-effective ion-assisted thin film growth technique called moving focused magnetic field magnetron sputtering. At the core of this technology lies the generation of dense plasma within a small area of the target and the controlled movement of this plasma across the entire target surface. The deposition process, powered by a direct current generator, behaves similarly to high-power impulse magnetron sputtering and yields coatings with properties comparable to those produced by this method. Notably, this study marks the first application of an ion meter to measure the ionized metal flux fraction of sputtered titanium at industrial conditions, revealing values of up to 34% measured at the substrate position.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10300 - Physical sciences

Projekt

<a href="/cs/project/LM2023039" target="_blank" >LM2023039: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

1879-3347

Svazek periodika

487

Číslo periodika v rámci svazku

July 2024

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

7

Strana od-do

1-7

Kód UT WoS článku

001260010200001

EID výsledku v databázi Scopus

2-s2.0-85196742483