Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14740%2F13%3A00065705" target="_blank" >RIV/00216224:14740/13:00065705 - isvavai.cz</a>

Výsledek na webu

<a href="http://onlinelibrary.wiley.com/doi/10.1002/sia.5250/abstract" target="_blank" >http://onlinelibrary.wiley.com/doi/10.1002/sia.5250/abstract</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/sia.5250" target="_blank" >10.1002/sia.5250</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films

Popis výsledku v původním jazyce

Variable-angle spectroscopic ellipsometry is employed for the optical characterization of non-stoichiometric silicon nitride thin films exhibiting inhomogeneity formed by refractive index and extinction index changes through the film thickness. For all the film samples, the best fit of the experimental data is achieved if, in addition to the inhomogeneity, an overlayer or roughness of the upper boundary is included. However, distinguishing of these two defects is found not to be possible. The influenceof working gas ratio, deposition temperature and on/off time on the film properties is studied. The refractive index and extinction coefficient is found to increase with increasing working gas ratio and less significantly with decreasing deposition temperature. It is also found that the inhomogeneity increases with decreasing deposition temperature, and the deposition rate of the films decreases with increasing working gas ratio.

Název v anglickém jazyce

Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films

Popis výsledku anglicky

Variable-angle spectroscopic ellipsometry is employed for the optical characterization of non-stoichiometric silicon nitride thin films exhibiting inhomogeneity formed by refractive index and extinction index changes through the film thickness. For all the film samples, the best fit of the experimental data is achieved if, in addition to the inhomogeneity, an overlayer or roughness of the upper boundary is included. However, distinguishing of these two defects is found not to be possible. The influenceof working gas ratio, deposition temperature and on/off time on the film properties is studied. The refractive index and extinction coefficient is found to increase with increasing working gas ratio and less significantly with decreasing deposition temperature. It is also found that the inhomogeneity increases with decreasing deposition temperature, and the deposition rate of the films decreases with increasing working gas ratio.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Interface Analysis

ISSN

0142-2421

e-ISSN

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Svazek periodika

45

Číslo periodika v rámci svazku

7

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

5

Strana od-do

1188-1192

Kód UT WoS článku

000320332300018

EID výsledku v databázi Scopus

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