Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49610040%3A_____%2F13%3A%230000015" target="_blank" >RIV/49610040:_____/13:#0000015 - isvavai.cz</a>

Výsledek na webu

<a href="http://wileyonlinelibrary.com/journal/sia" target="_blank" >http://wileyonlinelibrary.com/journal/sia</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/sia.5250" target="_blank" >10.1002/sia.5250</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films

Popis výsledku v původním jazyce

Variable-angle spectroscopic ellipsometry is employed for the optical characterization of non-stoichiometric silicon nitride thin films exhibiting inhomogeneity formed by refractive index and extinction index changes through the film thickness. For all the film samples, the best fit of the experimental data is achieved if, in addition to the inhomogeneity, an overlayer or roughness of the upper boundary is included. However, distinguishing of these two defects is found not to be possible. The influenceof working gas ratio, deposition temperature and on/off time on the film properties is studied. The refractive index and extinction coefficient is found to increase with increasing working gas ratio and less significantly with decreasing deposition temperature. It is also found that the inhomogeneity increases with decreasing deposition temperature, and the deposition rate of the films decreases with increasing working gas ratio. The influence of the on/off time on the film properties is

Název v anglickém jazyce

Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films

Popis výsledku anglicky

Variable-angle spectroscopic ellipsometry is employed for the optical characterization of non-stoichiometric silicon nitride thin films exhibiting inhomogeneity formed by refractive index and extinction index changes through the film thickness. For all the film samples, the best fit of the experimental data is achieved if, in addition to the inhomogeneity, an overlayer or roughness of the upper boundary is included. However, distinguishing of these two defects is found not to be possible. The influenceof working gas ratio, deposition temperature and on/off time on the film properties is studied. The refractive index and extinction coefficient is found to increase with increasing working gas ratio and less significantly with decreasing deposition temperature. It is also found that the inhomogeneity increases with decreasing deposition temperature, and the deposition rate of the films decreases with increasing working gas ratio. The influence of the on/off time on the film properties is

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

<a href="/cs/project/FR-TI1%2F168" target="_blank" >FR-TI1/168: Barevné solární články s vysokou účinností pro architektonické aplikace</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Interface Annalysis

ISSN

1096-9918

e-ISSN

—

Svazek periodika

—

Číslo periodika v rámci svazku

2013-02-21

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

5

Strana od-do

—

Kód UT WoS článku

—

EID výsledku v databázi Scopus

—