Humidity resistant hydrogenated carbon nitride films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14740%2F13%3A00066624" target="_blank" >RIV/00216224:14740/13:00066624 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61389005:_____/13:00397640 RIV/68081731:_____/13:00397640 RIV/00216305:26620/13:PU103576

Výsledek na webu

<a href="http://www.sciencedirect.com/science/article/pii/S0169433213005011" target="_blank" >http://www.sciencedirect.com/science/article/pii/S0169433213005011</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2013.03.033" target="_blank" >10.1016/j.apsusc.2013.03.033</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Humidity resistant hydrogenated carbon nitride films

Popis výsledku v původním jazyce

The aim of this study is to prepare the hydrogenated carbon nitrides films which possess good adhesion to silicon substrates and stability in humid surroundings. The films were prepared by magnetron sputtering from pure graphite target in a nitrogen-hydrogen discharge. Two main factors can lead to delamination of the films. The first is the high value of residual stress and the second is the absorption of moisture into the bulk and their affect on films/substrates interface. Both factors were eliminatedby adding hydrogen and post-deposition annealing in the vacuum. The influence of annealing (to 200, 400, 600, 800 and 1000 degrees C) on chemical composition and microstructure was studied by various methods. For preparation of humidity (water) resistant films we have added 15% partial pressure of hydrogen to nitrogen discharge and annealed the samples in vacuum to minimum temperature, which was 600 degrees C. The heating to 600 degrees C causes the increasing of carbon -nitride ratio f

Název v anglickém jazyce

Humidity resistant hydrogenated carbon nitride films

Popis výsledku anglicky

The aim of this study is to prepare the hydrogenated carbon nitrides films which possess good adhesion to silicon substrates and stability in humid surroundings. The films were prepared by magnetron sputtering from pure graphite target in a nitrogen-hydrogen discharge. Two main factors can lead to delamination of the films. The first is the high value of residual stress and the second is the absorption of moisture into the bulk and their affect on films/substrates interface. Both factors were eliminatedby adding hydrogen and post-deposition annealing in the vacuum. The influence of annealing (to 200, 400, 600, 800 and 1000 degrees C) on chemical composition and microstructure was studied by various methods. For preparation of humidity (water) resistant films we have added 15% partial pressure of hydrogen to nitrogen discharge and annealed the samples in vacuum to minimum temperature, which was 600 degrees C. The heating to 600 degrees C causes the increasing of carbon -nitride ratio f

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

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Svazek periodika

275

Číslo periodika v rámci svazku

Jun

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

7

Strana od-do

7-13

Kód UT WoS článku

000318977300003

EID výsledku v databázi Scopus

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