One-dimensional anodic TiO2 nanotubes coated by atomic layer deposition: Towards advanced applications
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F19%3A39912662" target="_blank" >RIV/00216275:25310/19:39912662 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/00216305:26620/19:PU130085
Výsledek na webu
<a href="https://www.sciencedirect.com/science/article/pii/S2352940718305341" target="_blank" >https://www.sciencedirect.com/science/article/pii/S2352940718305341</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apmt.2018.11.005" target="_blank" >10.1016/j.apmt.2018.11.005</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
One-dimensional anodic TiO2 nanotubes coated by atomic layer deposition: Towards advanced applications
Popis výsledku v původním jazyce
Atomic layer deposition (ALD) represents a unique deposition technique that allows to coat uniformly var-ious high aspect ratio (HAR) porous nanostructures, in addition to its traditional role to coat flat substrates(e.g. Si wafers). Self-organized anodic TiO2nanotube (TNT) layers belong among the most investigatedinorganic nanostructures. They possess highly functional materials with promising application potentialacross many technological fields. Herein, we review the utilization of ALD for the functionalization ofanodic TNT layers by secondary materials to advance their physicochemical and photoelectrochemicalproperties. First, the application of ALD for functionalization of porous aluminium oxide, which representfundamental HAR nanostructure, is briefly introduced. Then the main experimental parameters govern-ing the uniformity and the conformality of ALD coating within HAR nanostructures are discussed. Finally,the review focuses on the use of ALD to deposit secondary materials into TNT layers for various purposes— the introduction of pioneering studies is followed by particular examples of ALD based functional-izations of coated TNT layers for optimized visible-light absorption, charge separation and passivation,(photo)catalysis, stability, gas sensing, and energy storage.
Název v anglickém jazyce
One-dimensional anodic TiO2 nanotubes coated by atomic layer deposition: Towards advanced applications
Popis výsledku anglicky
Atomic layer deposition (ALD) represents a unique deposition technique that allows to coat uniformly var-ious high aspect ratio (HAR) porous nanostructures, in addition to its traditional role to coat flat substrates(e.g. Si wafers). Self-organized anodic TiO2nanotube (TNT) layers belong among the most investigatedinorganic nanostructures. They possess highly functional materials with promising application potentialacross many technological fields. Herein, we review the utilization of ALD for the functionalization ofanodic TNT layers by secondary materials to advance their physicochemical and photoelectrochemicalproperties. First, the application of ALD for functionalization of porous aluminium oxide, which representfundamental HAR nanostructure, is briefly introduced. Then the main experimental parameters govern-ing the uniformity and the conformality of ALD coating within HAR nanostructures are discussed. Finally,the review focuses on the use of ALD to deposit secondary materials into TNT layers for various purposes— the introduction of pioneering studies is followed by particular examples of ALD based functional-izations of coated TNT layers for optimized visible-light absorption, charge separation and passivation,(photo)catalysis, stability, gas sensing, and energy storage.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
20506 - Coating and films
Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2019
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Applied Materials Today
ISSN
2352-9407
e-ISSN
—
Svazek periodika
14
Číslo periodika v rámci svazku
March
Stát vydavatele periodika
NL - Nizozemsko
Počet stran výsledku
20
Strana od-do
1-20
Kód UT WoS článku
000458430900001
EID výsledku v databázi Scopus
—