The World Scientific Reference of Amorphous Materials, Volume 1: Structure, Properties, Modeling and Applications of Amorphous Chalcogenides, CHAPTER 19: High-Resolution Photoresists

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F21%3A39917667" target="_blank" >RIV/00216275:25310/21:39917667 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.worldscientific.com/doi/10.1142/9789811215575_0019" target="_blank" >https://www.worldscientific.com/doi/10.1142/9789811215575_0019</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1142/9789811215575_0019" target="_blank" >10.1142/9789811215575_0019</a>

Jazyk výsledku

angličtina

Název v původním jazyce

The World Scientific Reference of Amorphous Materials, Volume 1: Structure, Properties, Modeling and Applications of Amorphous Chalcogenides, CHAPTER 19: High-Resolution Photoresists

Popis výsledku v původním jazyce

Chalcogenide glass thin films are frequently sensitive to various kinds of radiation (e.g., ultraviolet [UV]/visible [VIS], X-ray, electron beam). Structure of the material can be significantly altered by suitable irradiation causing either advanced polymerization or bond cleavage. Structural changes consequently influence the glass resistance to the developer resulting in selective etching, which makes chalcogenide glasses suitable material for micro/nano patterning. Chalcogenide glasses can act as both positive and negative photoresist in dependence on many parameters such as composition of the glass and the developer, method used for thin film deposition, thermal history of the sample, and others. Structural and chemical mechanisms accountable for significant differences in chemical resistance are discussed in detail. Multiple examples of patterned thin films applicable either directly in optics or serving as traditional photoresist transferring the desired structure to the undelaying substrate, are provided.

Název v anglickém jazyce

The World Scientific Reference of Amorphous Materials, Volume 1: Structure, Properties, Modeling and Applications of Amorphous Chalcogenides, CHAPTER 19: High-Resolution Photoresists

Popis výsledku anglicky

Chalcogenide glass thin films are frequently sensitive to various kinds of radiation (e.g., ultraviolet [UV]/visible [VIS], X-ray, electron beam). Structure of the material can be significantly altered by suitable irradiation causing either advanced polymerization or bond cleavage. Structural changes consequently influence the glass resistance to the developer resulting in selective etching, which makes chalcogenide glasses suitable material for micro/nano patterning. Chalcogenide glasses can act as both positive and negative photoresist in dependence on many parameters such as composition of the glass and the developer, method used for thin film deposition, thermal history of the sample, and others. Structural and chemical mechanisms accountable for significant differences in chemical resistance are discussed in detail. Multiple examples of patterned thin films applicable either directly in optics or serving as traditional photoresist transferring the desired structure to the undelaying substrate, are provided.

Druh

C - Kapitola v odborné knize

CEP obor

—

OECD FORD obor

10306 - Optics (including laser optics and quantum optics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název knihy nebo sborníku

The World Scientific Reference Of Amorphous Materials : Structure, Properties, Modeling And Main Applications. Vol. 1

ISBN

978-981-12-1555-1

Počet stran výsledku

29

Strana od-do

651-679

Počet stran knihy

7364

Název nakladatele

World Scientific Publishing Co.

Místo vydání

Singapur

Kód UT WoS kapitoly

—