Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F14%3APU113720" target="_blank" >RIV/00216305:26310/14:PU113720 - isvavai.cz</a>
Výsledek na webu
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DOI - Digital Object Identifier
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Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power
Popis výsledku v původním jazyce
We found out that the monomer deficient conditions enable to control mechanical and optical properties of plasma polymer films by RF power using plasma-enhanced chemical vapor deposition. The monomer deficient conditions may be characterized by the plasma process pressure (plasma switched on) lower than the basic process pressure (plasma switched off), which means that the concentration of reactive species is not insignificant or is even comparable with the concentration of monomer molecules. The monomer deficient conditions are achieved at lower monomer flow rates (0.5-10 sccm) operated at lower basic process pressures (1-5 Pa). In this study, we plasma polymerized tetravinylsilane at a mass flow rate of 3.8sccm operated at a basic process pressure of3.0 Pa, and RF power ranging 10-70 W using continuous wave. The plasma process pressure decreased from 1.7 Pa (10 W) to 1.1 Pa (70 W) at enhanced power. The plasma species were monitored by mass spectrometry and correlated with chemical
Název v anglickém jazyce
Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power
Popis výsledku anglicky
We found out that the monomer deficient conditions enable to control mechanical and optical properties of plasma polymer films by RF power using plasma-enhanced chemical vapor deposition. The monomer deficient conditions may be characterized by the plasma process pressure (plasma switched on) lower than the basic process pressure (plasma switched off), which means that the concentration of reactive species is not insignificant or is even comparable with the concentration of monomer molecules. The monomer deficient conditions are achieved at lower monomer flow rates (0.5-10 sccm) operated at lower basic process pressures (1-5 Pa). In this study, we plasma polymerized tetravinylsilane at a mass flow rate of 3.8sccm operated at a basic process pressure of3.0 Pa, and RF power ranging 10-70 W using continuous wave. The plasma process pressure decreased from 1.7 Pa (10 W) to 1.1 Pa (70 W) at enhanced power. The plasma species were monitored by mass spectrometry and correlated with chemical
Klasifikace
Druh
O - Ostatní výsledky
CEP obor
CF - Fyzikální chemie a teoretická chemie
OECD FORD obor
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Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2014
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů