AFM Study of Al2O3 Thin Films Prepared by Plasma Oxidation

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F00%3A00000561" target="_blank" >RIV/44555601:13430/00:00000561 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

AFM Study of Al2O3 Thin Films Prepared by Plasma Oxidation

Popis výsledku v původním jazyce

The surface structure features of Al2O3 thin films, which were prepared by plasma oxidation of aluminium thin films, were observed using atomic force microscopy (AFM). The alumina thin films were prepared at different sample bias voltages for demonstration of the preparation condition influence. It was found that the value of sample bias voltage plays an indispensable role for surface structure of the alumina film. Structural properties of the Al2O3 films could be affected during preparation due to plasma particle bombardment. The thickness of Al, Al-Al2O3, and Al-Al2O3-Al structures was derived from the AFM images of surfaces with a mechanical scratch.

Název v anglickém jazyce

AFM Study of Al2O3 Thin Films Prepared by Plasma Oxidation

Popis výsledku anglicky

The surface structure features of Al2O3 thin films, which were prepared by plasma oxidation of aluminium thin films, were observed using atomic force microscopy (AFM). The alumina thin films were prepared at different sample bias voltages for demonstration of the preparation condition influence. It was found that the value of sample bias voltage plays an indispensable role for surface structure of the alumina film. Structural properties of the Al2O3 films could be affected during preparation due to plasma particle bombardment. The thickness of Al, Al-Al2O3, and Al-Al2O3-Al structures was derived from the AFM images of surfaces with a mechanical scratch.

Druh

A - Audiovizuální tvorba

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

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Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2000

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

ISBN

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Místo vydání

Nancy

Název nakladatele resp. objednatele

Société Francaise du Vide

Verze

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Identifikační číslo nosiče

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