Influence of Plasma Parameters on Structual Properties of Al2O3 Films Prepared by Plasma Oxidation

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F00%3A00000568" target="_blank" >RIV/44555601:13430/00:00000568 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Influence of Plasma Parameters on Structual Properties of Al2O3 Films Prepared by Plasma Oxidation

Popis výsledku v původním jazyce

The aim of the work is to study a correlation between plasma parameters of argon/oxygen discharge on one hand and surface structure features of alumina films on the other hand. Experiments were performed in a system for plasma-chemical surface modification of thin films. In our experiments we used a DC discharge to generate the plasma. The main diagnostic techniques applied to determine the plasma parameters were optical and probe diagnostics. A thin film surface analysis was carried out by means of atomic force microscopy (AFM) technique. The plasma oxidation process is sensitive to the nature of the plasma. It is defined by such parameters as argon/oxygen ratio, pressure and dissipated power. Different discharge parameters were tested for the plasmaoxidation process. The alumina thin films were prepared at different sample bias voltages. The surface structure of alumina films depends on preparation conditions. A comparison of the results obtained under different plasma oxidation con

Název v anglickém jazyce

Influence of Plasma Parameters on Structual Properties of Al2O3 Films Prepared by Plasma Oxidation

Popis výsledku anglicky

The aim of the work is to study a correlation between plasma parameters of argon/oxygen discharge on one hand and surface structure features of alumina films on the other hand. Experiments were performed in a system for plasma-chemical surface modification of thin films. In our experiments we used a DC discharge to generate the plasma. The main diagnostic techniques applied to determine the plasma parameters were optical and probe diagnostics. A thin film surface analysis was carried out by means of atomic force microscopy (AFM) technique. The plasma oxidation process is sensitive to the nature of the plasma. It is defined by such parameters as argon/oxygen ratio, pressure and dissipated power. Different discharge parameters were tested for the plasmaoxidation process. The alumina thin films were prepared at different sample bias voltages. The surface structure of alumina films depends on preparation conditions. A comparison of the results obtained under different plasma oxidation con

Druh

A - Audiovizuální tvorba

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

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Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2000

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

ISBN

953-98154-0-X

Místo vydání

Pula

Název nakladatele resp. objednatele

Croatian Vacuum Society

Verze

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Identifikační číslo nosiče

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