Investigations of SnO2 thin films prepared by plasma oxidation.

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F02%3A00001973" target="_blank" >RIV/44555601:13430/02:00001973 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Investigations of SnO2 thin films prepared by plasma oxidation.

Popis výsledku v původním jazyce

In this work, we have studied properties of SnO2 thin films produced by thermal evaporation of Sn films followed by in situ plasma oxidation. The layer properties were studied by atomic force microscopy, Rutherford backscattering spectrometry and X-ray photoelectron spectroscopy. The surface morphology of the tin films is characterized with a near flat-grain structure appearance and a root mean square rougness Rq - 12 nm. The typical grain size of the tin films was about 0,5 um. Surface morphology of the tin dioxide is characterized by a sharper grain structure with a higher roughness Rq - 14 nm.Th etypical grain size was about 0,2 um in this case. The SnO2 films prepared by plasma oxidation at long oxidation times led to a higher thickness of oxide layers and it varied from 37 to 65 nm when oxidation time varied from 10 and 20 min. This work gives information about the feasibility of presented diagnostic methods for characterization of SnO2 thin films prepared by plasma oxidation.

Název v anglickém jazyce

Investigations of SnO2 thin films prepared by plasma oxidation.

Popis výsledku anglicky

In this work, we have studied properties of SnO2 thin films produced by thermal evaporation of Sn films followed by in situ plasma oxidation. The layer properties were studied by atomic force microscopy, Rutherford backscattering spectrometry and X-ray photoelectron spectroscopy. The surface morphology of the tin films is characterized with a near flat-grain structure appearance and a root mean square rougness Rq - 12 nm. The typical grain size of the tin films was about 0,5 um. Surface morphology of the tin dioxide is characterized by a sharper grain structure with a higher roughness Rq - 14 nm.Th etypical grain size was about 0,2 um in this case. The SnO2 films prepared by plasma oxidation at long oxidation times led to a higher thickness of oxide layers and it varied from 37 to 65 nm when oxidation time varied from 10 and 20 min. This work gives information about the feasibility of presented diagnostic methods for characterization of SnO2 thin films prepared by plasma oxidation.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2002

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

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Svazek periodika

67

Číslo periodika v rámci svazku

3

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

7

Strana od-do

665-671

Kód UT WoS článku

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EID výsledku v databázi Scopus

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