Deposition and characterization of single magnetron deposited Fe:SnOx coatings

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13440%2F15%3A43887147" target="_blank" >RIV/44555601:13440/15:43887147 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.tsf.2015.11.009" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2015.11.009</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2015.11.009" target="_blank" >10.1016/j.tsf.2015.11.009</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Deposition and characterization of single magnetron deposited Fe:SnOx coatings

Popis výsledku v původním jazyce

Coatings deposited by magnetron co-sputtering from a single RF magnetron with a ceramic SnO2 target with iron inset in argon plasma were studied. The mass spectra of the process identified Sn+ and SnO+ species as the dominant species sputtered from the target, but no SnO2+ species were detected. The dominant positive ions in argon plasma are Ar+ species. The only detected negative ions were OMINUS SIGN . Sputtered neutral tin related species were not detected. Iron related species were also not detectedbecause their concentration is below the detection limit. The concentration of iron dopant in the tin oxide coatings was controlled by the RF bias applied on the substrate holder while the discharge pressure also has some influence. The iron concentration was in the range from 0.9 at.% up to 19 at.% increasing with the substrate bias while the sheet resistivity decreases. The stoichiometry ratio of O/(Sn + Fe) in the coatings increased from 1.7 up to 2 in dependence on the substrate bia

Název v anglickém jazyce

Deposition and characterization of single magnetron deposited Fe:SnOx coatings

Popis výsledku anglicky

Coatings deposited by magnetron co-sputtering from a single RF magnetron with a ceramic SnO2 target with iron inset in argon plasma were studied. The mass spectra of the process identified Sn+ and SnO+ species as the dominant species sputtered from the target, but no SnO2+ species were detected. The dominant positive ions in argon plasma are Ar+ species. The only detected negative ions were OMINUS SIGN . Sputtered neutral tin related species were not detected. Iron related species were also not detectedbecause their concentration is below the detection limit. The concentration of iron dopant in the tin oxide coatings was controlled by the RF bias applied on the substrate holder while the discharge pressure also has some influence. The iron concentration was in the range from 0.9 at.% up to 19 at.% increasing with the substrate bias while the sheet resistivity decreases. The stoichiometry ratio of O/(Sn + Fe) in the coatings increased from 1.7 up to 2 in dependence on the substrate bia

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JK - Koroze a povrchové úpravy materiálu

OECD FORD obor

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Projekt

<a href="/cs/project/GA13-06989S" target="_blank" >GA13-06989S: Plazmo-chemické modifikace fylosilikátů pro funkční nanostruktury</a><br>

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Svazek periodika

595

Číslo periodika v rámci svazku

NOV 30 2015

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

200-208

Kód UT WoS článku

000365812400034

EID výsledku v databázi Scopus

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