Effect of ion bombarding energies on photocatalytic TiO2 films growing in a pulsed dual magnetron discharge

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F11%3A43898484" target="_blank" >RIV/49777513:23520/11:43898484 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1116/1.3563612" target="_blank" >http://dx.doi.org/10.1116/1.3563612</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/1.3563612" target="_blank" >10.1116/1.3563612</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of ion bombarding energies on photocatalytic TiO2 films growing in a pulsed dual magnetron discharge

Popis výsledku v původním jazyce

Photocatalytic crystalline TiO2 films were deposited by a pulsed dc dual magnetron system. The depositions were performed using two unbalanced magnetrons with planar titanium targets of 50 mm diameter in Ar+O2 gas mixtures at a total pressure of 0.9 Pa and with the maximum substrate surface temperature of 160 °C. Both magnetrons operated in the asymmetric bipolar pulsed mode. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. The measured structure of the ion energy distributions was correlated with the distinct pulse phases of the magnetron discharges. A decrease in the energy delivered by fast ions to the unit volume of the growing films resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO2 films.

Název v anglickém jazyce

Effect of ion bombarding energies on photocatalytic TiO2 films growing in a pulsed dual magnetron discharge

Popis výsledku anglicky

Photocatalytic crystalline TiO2 films were deposited by a pulsed dc dual magnetron system. The depositions were performed using two unbalanced magnetrons with planar titanium targets of 50 mm diameter in Ar+O2 gas mixtures at a total pressure of 0.9 Pa and with the maximum substrate surface temperature of 160 °C. Both magnetrons operated in the asymmetric bipolar pulsed mode. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. The measured structure of the ion energy distributions was correlated with the distinct pulse phases of the magnetron discharges. A decrease in the energy delivered by fast ions to the unit volume of the growing films resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO2 films.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/OC10045" target="_blank" >OC10045: Nové plazmové zdroje pro depozici vrstev a modifikaci povrchů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Vacuum Science and Technology A

ISSN

0734-2101

e-ISSN

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Svazek periodika

29

Číslo periodika v rámci svazku

3

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

7

Strana od-do

"031301-1"-"031301-7"

Kód UT WoS článku

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EID výsledku v databázi Scopus

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