Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F13%3A43918481" target="_blank" >RIV/49777513:23520/13:43918481 - isvavai.cz</a>

Výsledek na webu

<a href="http://stacks.iop.org/JPhysD/46/205205" target="_blank" >http://stacks.iop.org/JPhysD/46/205205</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0022-3727/46/20/205205" target="_blank" >10.1088/0022-3727/46/20/205205</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux

Popis výsledku v původním jazyce

We systematically investigate and quantify different physical phenomena influencing the deposition rate, aD, of Nb coatings prepared by high power impulse magnetron sputtering (HiPIMS), and propose a straightforward approach for deposition rate enhancement through the control of the magnetron's magnetic field. The magnetic field strength at the target surface, B, of a 50 mm diameter magnetron was controlled by the application of paramagnetic spacers with different thicknesses in between the magnetron surface and the target. We found that lowering B achieved by the application of a 2.8 mm thick spacer led to an increase in aD by a factor of ~4.5 (from 10.6 to 45.2 nm/min) when the discharge was operated at a fixed average pulse target power density (2.5kW/cm2). However, the ionized fraction of the deposition flux onto the substrate was found to be comparable, despite a large difference in B-dependent discharge characteristics (magnetron voltage and discharge current). We show that the

Název v anglickém jazyce

Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux

Popis výsledku anglicky

We systematically investigate and quantify different physical phenomena influencing the deposition rate, aD, of Nb coatings prepared by high power impulse magnetron sputtering (HiPIMS), and propose a straightforward approach for deposition rate enhancement through the control of the magnetron's magnetic field. The magnetic field strength at the target surface, B, of a 50 mm diameter magnetron was controlled by the application of paramagnetic spacers with different thicknesses in between the magnetron surface and the target. We found that lowering B achieved by the application of a 2.8 mm thick spacer led to an increase in aD by a factor of ~4.5 (from 10.6 to 45.2 nm/min) when the discharge was operated at a fixed average pulse target power density (2.5kW/cm2). However, the ionized fraction of the deposition flux onto the substrate was found to be comparable, despite a large difference in B-dependent discharge characteristics (magnetron voltage and discharge current). We show that the

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Physics D: Applied Physics

ISSN

0022-3727

e-ISSN

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Svazek periodika

2013

Číslo periodika v rámci svazku

46

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

10

Strana od-do

2052051-20520510

Kód UT WoS článku

000318546100011

EID výsledku v databázi Scopus

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