The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F19%3A00519372" target="_blank" >RIV/68378271:_____/19:00519372 - isvavai.cz</a>

Výsledek na webu

<a href="http://hdl.handle.net/11104/0304364" target="_blank" >http://hdl.handle.net/11104/0304364</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/plasma2020015" target="_blank" >10.3390/plasma2020015</a>

Jazyk výsledku

angličtina

Název v původním jazyce

The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge

Popis výsledku v původním jazyce

We explored the effect of magnetic field strength B and geometry (degree of balancing) on the deposition rate and ionized flux fraction Fflux in dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) when depositing titanium. The HiPIMS discharge was run in two different operating modes. The first one we refer to as “fixed voltage mode” where the cathode voltage was kept fixed at 625 V while the pulse repetition frequency was varied to achieve the desired time average power (300 W). The second mode we refer to as “fixed peak current mode” and was carried out by adjusting the cathode voltage to maintain a fixed peak discharge current and by varying the frequency to achieve the same average power. Our results show that the dcMS deposition rate was weakly sensitive to variations in the magnetic field while the deposition rate during HiPIMS operated in fixed voltage mode changed from 30% to 90% of the dcMS deposition rate as B decreased.

Název v anglickém jazyce

The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge

Popis výsledku anglicky

We explored the effect of magnetic field strength B and geometry (degree of balancing) on the deposition rate and ionized flux fraction Fflux in dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) when depositing titanium. The HiPIMS discharge was run in two different operating modes. The first one we refer to as “fixed voltage mode” where the cathode voltage was kept fixed at 625 V while the pulse repetition frequency was varied to achieve the desired time average power (300 W). The second mode we refer to as “fixed peak current mode” and was carried out by adjusting the cathode voltage to maintain a fixed peak discharge current and by varying the frequency to achieve the same average power. Our results show that the dcMS deposition rate was weakly sensitive to variations in the magnetic field while the deposition rate during HiPIMS operated in fixed voltage mode changed from 30% to 90% of the dcMS deposition rate as B decreased.

Druh

J_ost - Ostatní články v recenzovaných periodicích

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma

ISSN

2571-6182

e-ISSN

—

Svazek periodika

2

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

21

Strana od-do

201-221

Kód UT WoS článku

—

EID výsledku v databázi Scopus

—