High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F14%3A43922535" target="_blank" >RIV/49777513:23520/14:43922535 - isvavai.cz</a>

Výsledek na webu

<a href="http://www.sciencedirect.com/science/article/pii/S0040609014007548" target="_blank" >http://www.sciencedirect.com/science/article/pii/S0040609014007548</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2014.07.033" target="_blank" >10.1016/j.tsf.2014.07.033</a>

Jazyk výsledku

angličtina

Název v původním jazyce

High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties

Popis výsledku v původním jazyce

High-power impulse magnetron sputtering of a planar Ta target in various Ar+O2+N2 gas mixtures was investigated. A strongly unbalanced magnetron was driven by a pulsed dc power supply at the average target power density in a pulse. Si (100) and glass substrates were at a floating potential, and the substrate temperatures were less than 285 °C. A pulsed reactive gas (O2 and N2) flow control made it possible to produce high-quality Ta-O-N films of various elemental compositions with high deposition ratesof 97 - 190 nm/min. The film compositions (in at.%) were varied gradually from Ta28O71 with less than 1 at. % of H to Ta38O4N55 with 3 at. % of H. The Ta27O40N31 films with 2 at. % of H, which were produced with the highest deposition rate of 190 nm/min,were nanocrystalline with an optical band gap of 2.5 eV. These films with a shift of the absorption edge to 500 nm are potential candidates for application as visible-light driven photocatalysts.

Název v anglickém jazyce

High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties

Popis výsledku anglicky

High-power impulse magnetron sputtering of a planar Ta target in various Ar+O2+N2 gas mixtures was investigated. A strongly unbalanced magnetron was driven by a pulsed dc power supply at the average target power density in a pulse. Si (100) and glass substrates were at a floating potential, and the substrate temperatures were less than 285 °C. A pulsed reactive gas (O2 and N2) flow control made it possible to produce high-quality Ta-O-N films of various elemental compositions with high deposition ratesof 97 - 190 nm/min. The film compositions (in at.%) were varied gradually from Ta28O71 with less than 1 at. % of H to Ta38O4N55 with 3 at. % of H. The Ta27O40N31 films with 2 at. % of H, which were produced with the highest deposition rate of 190 nm/min,were nanocrystalline with an optical band gap of 2.5 eV. These films with a shift of the absorption edge to 500 nm are potential candidates for application as visible-light driven photocatalysts.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

<a href="/cs/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostrukturní multifunkční povlaky připravené užitím silně ionizovaného pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Svazek periodika

2014

Číslo periodika v rámci svazku

566

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

70-77

Kód UT WoS článku

000341057300012

EID výsledku v databázi Scopus

—