Structure and properties of Hf-O-N films prepared by high-rate reactive HiPIMS with smoothly controlled composition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43931447" target="_blank" >RIV/49777513:23520/17:43931447 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216208:11320/17:10371320

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.ceramint.2017.01.102" target="_blank" >http://dx.doi.org/10.1016/j.ceramint.2017.01.102</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.ceramint.2017.01.102" target="_blank" >10.1016/j.ceramint.2017.01.102</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Structure and properties of Hf-O-N films prepared by high-rate reactive HiPIMS with smoothly controlled composition

Popis výsledku v původním jazyce

Hafnium oxynitride ceramics were prepared in the form of thin films by high-power impulse magnetron sputtering of Hf in various Ar+O2+N2 gas mixtures. Smooth composition control was achieved by maximizing the degree of dissociation in plasma, suppressing the importance of the difference between reactivities of undissociated O2 and N2. The application potential of the films was further enhanced by extremely high deposition rates (e.g. 230 nm/min for stoichiometric HfO2; achieved by feedback pulsed reactive gas flow control), low deposition temperatures (&lt; 140 °C) and not using any substrate bias. We focus on the relationships between elemental composition, phase structure, and optical, electrical, mechanical and hydrophobic properties of the materials. We quantify the evolution of smoothly controlled film properties along the transition from an oxide to a nitride, such as increasing extinction coefficient, decreasing electrical resistivity, increasing hardness or increasing water droplet contact angle.

Název v anglickém jazyce

Structure and properties of Hf-O-N films prepared by high-rate reactive HiPIMS with smoothly controlled composition

Popis výsledku anglicky

Hafnium oxynitride ceramics were prepared in the form of thin films by high-power impulse magnetron sputtering of Hf in various Ar+O2+N2 gas mixtures. Smooth composition control was achieved by maximizing the degree of dissociation in plasma, suppressing the importance of the difference between reactivities of undissociated O2 and N2. The application potential of the films was further enhanced by extremely high deposition rates (e.g. 230 nm/min for stoichiometric HfO2; achieved by feedback pulsed reactive gas flow control), low deposition temperatures (&lt; 140 °C) and not using any substrate bias. We focus on the relationships between elemental composition, phase structure, and optical, electrical, mechanical and hydrophobic properties of the materials. We quantify the evolution of smoothly controlled film properties along the transition from an oxide to a nitride, such as increasing extinction coefficient, decreasing electrical resistivity, increasing hardness or increasing water droplet contact angle.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostrukturní multifunkční povlaky připravené užitím silně ionizovaného pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

CERAMICS INTERNATIONAL

ISSN

0272-8842

e-ISSN

—

Svazek periodika

43

Číslo periodika v rámci svazku

7

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

7

Strana od-do

5661-5667

Kód UT WoS článku

000397075900041

EID výsledku v databázi Scopus

2-s2.0-85010555673