Reactive high-power impulse magnetron sputtering of ZrO2 films with gradient ZrOx interlayers on pretreated steel substrates
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43931491" target="_blank" >RIV/49777513:23520/17:43931491 - isvavai.cz</a>
Výsledek na webu
<a href="http://dx.doi.org/10.1116/1.4978037" target="_blank" >http://dx.doi.org/10.1116/1.4978037</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/1.4978037" target="_blank" >10.1116/1.4978037</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Reactive high-power impulse magnetron sputtering of ZrO2 films with gradient ZrOx interlayers on pretreated steel substrates
Popis výsledku v původním jazyce
High-power impulse magnetron sputtering with a pulsed O2 flow control was used for reactive depositions of densified stoichiometric ZrO2 films with gradient ZrOx interlayers onto floating Si and steel substrates at low substrate temperatures (less than 150 °C). The depositions were performed using a strongly unbalanced magnetron with a planar Zr target of 100 mm diameter in Ar+O2 gas mixtures at the total pressure close to 2 Pa. Two kinds of gradient ZrOx interlayers with different depth profiles of the stoichiometric coefficient x were deposited using the feed-back pulsed O2 flow control. Prior to deposition, a modification of the substrate surfaces was performed by high-power impulse magnetron sputtering of the Zr target in Ar gas at the same pressure of 2 Pa and a dc substrate bias from –965 V to –620 V in a target pulse and low substrate temperatures (less than 150 °C) for 10 min. It was shown that the pretreatment of the steel substrates is a necessary condition for good adhesion of the zirconium oxide (both pure ZrO2 and ZrO2+ZrOx interlayer) films and that the adhesion of the ZrO2 films is substantially higher when the gradient ZrOx interlayers are used. The densified stoichiometric ZrO2 films (refractive index of 2.21 and extinction coefficient of 0.0004 at the wavelength of 550 nm) deposited onto the gradient ZrOx interlayers exhibited a high hardness (15–16 GPa) and an enhanced resistance to cracking.
Název v anglickém jazyce
Reactive high-power impulse magnetron sputtering of ZrO2 films with gradient ZrOx interlayers on pretreated steel substrates
Popis výsledku anglicky
High-power impulse magnetron sputtering with a pulsed O2 flow control was used for reactive depositions of densified stoichiometric ZrO2 films with gradient ZrOx interlayers onto floating Si and steel substrates at low substrate temperatures (less than 150 °C). The depositions were performed using a strongly unbalanced magnetron with a planar Zr target of 100 mm diameter in Ar+O2 gas mixtures at the total pressure close to 2 Pa. Two kinds of gradient ZrOx interlayers with different depth profiles of the stoichiometric coefficient x were deposited using the feed-back pulsed O2 flow control. Prior to deposition, a modification of the substrate surfaces was performed by high-power impulse magnetron sputtering of the Zr target in Ar gas at the same pressure of 2 Pa and a dc substrate bias from –965 V to –620 V in a target pulse and low substrate temperatures (less than 150 °C) for 10 min. It was shown that the pretreatment of the steel substrates is a necessary condition for good adhesion of the zirconium oxide (both pure ZrO2 and ZrO2+ZrOx interlayer) films and that the adhesion of the ZrO2 films is substantially higher when the gradient ZrOx interlayers are used. The densified stoichiometric ZrO2 films (refractive index of 2.21 and extinction coefficient of 0.0004 at the wavelength of 550 nm) deposited onto the gradient ZrOx interlayers exhibited a high hardness (15–16 GPa) and an enhanced resistance to cracking.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
20506 - Coating and films
Návaznosti výsledku
Projekt
<a href="/cs/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostrukturní multifunkční povlaky připravené užitím silně ionizovaného pulzního plazmatu</a><br>
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2017
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Journal of Vacuum Science and Technology A
ISSN
0734-2101
e-ISSN
—
Svazek periodika
35
Číslo periodika v rámci svazku
3
Stát vydavatele periodika
US - Spojené státy americké
Počet stran výsledku
9
Strana od-do
„031503-1“-„031503-9“
Kód UT WoS článku
000401122700025
EID výsledku v databázi Scopus
2-s2.0-85015620502