Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F15%3A43924833" target="_blank" >RIV/49777513:23520/15:43924833 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.vacuum.2014.12.004" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2014.12.004</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2014.12.004" target="_blank" >10.1016/j.vacuum.2014.12.004</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films

Popis výsledku v původním jazyce

High-power impulse magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric ZrO2 films onto floating substrates. The depositions were performed using a strongly unbalanced magnetron with a directly water-cooled planar Zr target of 100 mm diameter in argon-oxygen gas mixtures. An optimized location of the oxygen gas inlets in front of the target and their orientation toward the substrate made it possible to improve the quality of the films due to minimized arcing at the sputtered target and to enhance their deposition rates up to 120 nm/min. The films exhibited a hardness of 16 GPa, a refractive index of 2.19 and an extinction coefficientof 2x10-3 (both at the wavelength of 550 nm). Under these optimized conditions, we measured the highest (Zr+ + Zr2+) and (O2+ + O+) ion fractions in the total fluxes of positive ions, and a low population of high-energy O- ions at the sub

Název v anglickém jazyce

Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films

Popis výsledku anglicky

High-power impulse magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric ZrO2 films onto floating substrates. The depositions were performed using a strongly unbalanced magnetron with a directly water-cooled planar Zr target of 100 mm diameter in argon-oxygen gas mixtures. An optimized location of the oxygen gas inlets in front of the target and their orientation toward the substrate made it possible to improve the quality of the films due to minimized arcing at the sputtered target and to enhance their deposition rates up to 120 nm/min. The films exhibited a hardness of 16 GPa, a refractive index of 2.19 and an extinction coefficientof 2x10-3 (both at the wavelength of 550 nm). Under these optimized conditions, we measured the highest (Zr+ + Zr2+) and (O2+ + O+) ion fractions in the total fluxes of positive ions, and a low population of high-energy O- ions at the sub

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostrukturní multifunkční povlaky připravené užitím silně ionizovaného pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

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Svazek periodika

2015

Číslo periodika v rámci svazku

114

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

11

Strana od-do

131-141

Kód UT WoS článku

000351247700024

EID výsledku v databázi Scopus

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