Quantification of the hysteresis and related phenomena in reactive HiPIMS discharges

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43931478" target="_blank" >RIV/49777513:23520/17:43931478 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1063/1.4977819" target="_blank" >http://dx.doi.org/10.1063/1.4977819</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.4977819" target="_blank" >10.1063/1.4977819</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Quantification of the hysteresis and related phenomena in reactive HiPIMS discharges

Popis výsledku v původním jazyce

Reactive high-power impulse magnetron sputtering discharge has been studied experimentally combining optical emission, absorption, and laser-based diagnostic techniques. The quantification of the atomic ground state densities is performed using optical emission spectroscopy. Hysteresis behavior as a function of molecular oxygen flow fraction in Ar-O2 mixture has been observed for numerous discharge parameters, such as the ground state density of O atoms, density of the sputtered atoms and ions, Ar metastables, etc. The obtained atomic number densities are found to be in full agreement with the known models of reactive sputter deposition. The relevant plasma kinetic mechanisms influencing the measured trends are analyzed.

Název v anglickém jazyce

Quantification of the hysteresis and related phenomena in reactive HiPIMS discharges

Popis výsledku anglicky

Reactive high-power impulse magnetron sputtering discharge has been studied experimentally combining optical emission, absorption, and laser-based diagnostic techniques. The quantification of the atomic ground state densities is performed using optical emission spectroscopy. Hysteresis behavior as a function of molecular oxygen flow fraction in Ar-O2 mixture has been observed for numerous discharge parameters, such as the ground state density of O atoms, density of the sputtered atoms and ions, Ar metastables, etc. The obtained atomic number densities are found to be in full agreement with the known models of reactive sputter deposition. The relevant plasma kinetic mechanisms influencing the measured trends are analyzed.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

—

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

—

Svazek periodika

121

Číslo periodika v rámci svazku

17

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

10

Strana od-do

„171905-1“-„171905-10“

Kód UT WoS článku

000400623700007

EID výsledku v databázi Scopus

2-s2.0-85014561556