Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43932161" target="_blank" >RIV/49777513:23520/17:43932161 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1063/1.4996186" target="_blank" >http://dx.doi.org/10.1063/1.4996186</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.4996186" target="_blank" >10.1063/1.4996186</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study

Popis výsledku v původním jazyce

A time-dependent parametric model was applied to controlled reactive high-power impulse magnetron sputtering (HiPIMS) depositions of stoichiometric ZrO2 films, carried out in our laboratories, (i) to clarify the complicated dynamics of the processes on the target and substrate surfaces during voltage pulses, and (ii) to corroborate the importance of the O2 inlet configuration (position and direction) which strongly affects the O2 dissociation in the discharge and the chemisorption flux of oxygen atoms and molecules onto the substrate. For the experimental conditions with the to-substrate O2 inlets, the deposition-averaged target power density of 50 W/cm^2, and the oxygen partial pressure of 0.05 Pa (being close to the mean value during controlled depositions), our model predicts a low compound fraction, changing between 8% and 12%, in the target surface layer at an almost constant high compound fraction, changing between 92% and 93%, in the substrate surface layer during the pulse period (2000 μs). The calculated deposition rate of 89 nm/min for these films is in good agreement with the measured value of 80 nm/min achieved for optically transparent stoichiometric ZrO2 films prepared under these conditions.

Název v anglickém jazyce

Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study

Popis výsledku anglicky

A time-dependent parametric model was applied to controlled reactive high-power impulse magnetron sputtering (HiPIMS) depositions of stoichiometric ZrO2 films, carried out in our laboratories, (i) to clarify the complicated dynamics of the processes on the target and substrate surfaces during voltage pulses, and (ii) to corroborate the importance of the O2 inlet configuration (position and direction) which strongly affects the O2 dissociation in the discharge and the chemisorption flux of oxygen atoms and molecules onto the substrate. For the experimental conditions with the to-substrate O2 inlets, the deposition-averaged target power density of 50 W/cm^2, and the oxygen partial pressure of 0.05 Pa (being close to the mean value during controlled depositions), our model predicts a low compound fraction, changing between 8% and 12%, in the target surface layer at an almost constant high compound fraction, changing between 92% and 93%, in the substrate surface layer during the pulse period (2000 μs). The calculated deposition rate of 89 nm/min for these films is in good agreement with the measured value of 80 nm/min achieved for optically transparent stoichiometric ZrO2 films prepared under these conditions.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/GJ15-00859Y" target="_blank" >GJ15-00859Y: Design nových funkčních materiálů, a cest pro jejich přípravu atom po atomu, pomocí pokročilého počítačového modelování</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

—

Svazek periodika

122

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

9

Strana od-do

„043304-1“-„043304-9“

Kód UT WoS článku

000409414100022

EID výsledku v databázi Scopus

2-s2.0-85026547567